Abstract
This paper presents a design study on an optical setup for fabrication of a two-dimensional grating used in encoder systems. By adding major modifications to the conventional one-axis Lloyd's mirror interferometer, a modified two-axis Lloyd's mirror interferometer has been developed. Based on the wave optics, the two-axis interference patterns to be generated by the proposed optical configuration are simulated. To eliminate unwanted distortion of the two-dimensional micro patterns, polarization of the laser beams is controlled by inserting two half wave plates in the optical path. In addition, pattern exposure tests are carried out by using a prototype optical setup.
| Original language | English |
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| Publication status | Published - 2015 Oct 18 |
| Event | 8th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2015 - Kyoto, Japan Duration: 2015 Oct 18 → 2015 Oct 22 |
Conference
| Conference | 8th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2015 |
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| Country/Territory | Japan |
| City | Kyoto |
| Period | 15/10/18 → 15/10/22 |
Keywords
- Grating
- Interference lithography
- Lloyd's mirror interferometer
- Wave optics