Laser projection CVD using the low temperature condensation method

Kohji Takashima; Kazuyuki Minami; Masayoshi Esashi; Jun ichi Nishizawa

doi:10.1016/0169-4332(94)90438-3

Laser projection CVD using the low temperature condensation method

Kohji Takashima, Kazuyuki Minami, Masayoshi Esashi, Jun ichi Nishizawa

Research output: Contribution to journal › Article › peer-review

Abstract

Laser projection CVD using the low temperature condensation method was developed. By irradiating a cooled substrate with an ArF excimer laser in an organic gas environment, polymethylmethacrylate (PMMA), tin dioxide and silicon dioxide films were deposited selectively with a high deposition rate of about 0.1 μm min^-1. Special attention was given to the silicon dioxide film in order to obtain a high deposition rate and good quality. These films can be deposited successively, being promising for the realization of stacked microstructures. This technique can be also applied where a uniform resist coating is not possible. By using this technique, the PMMA film was selectively deposited on the end of an optical fiber.

Original language	English
Pages (from-to)	366-374
Number of pages	9
Journal	Applied Surface Science
Volume	79-80
Issue number	C
DOIs	https://doi.org/10.1016/0169-4332(94)90438-3
Publication status	Published - 1994 May 2
Externally published	Yes

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/0169-4332(94)90438-3

Cite this

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title = "Laser projection CVD using the low temperature condensation method",

abstract = "Laser projection CVD using the low temperature condensation method was developed. By irradiating a cooled substrate with an ArF excimer laser in an organic gas environment, polymethylmethacrylate (PMMA), tin dioxide and silicon dioxide films were deposited selectively with a high deposition rate of about 0.1 μm min-1. Special attention was given to the silicon dioxide film in order to obtain a high deposition rate and good quality. These films can be deposited successively, being promising for the realization of stacked microstructures. This technique can be also applied where a uniform resist coating is not possible. By using this technique, the PMMA film was selectively deposited on the end of an optical fiber.",

author = "Kohji Takashima and Kazuyuki Minami and Masayoshi Esashi and Nishizawa, {Jun ichi}",

note = "Funding Information: This work was supported by the Japanese Ministry of Education Science and Culture under a Grant-in-Aid No. 03102001. We would like to thank Professor Minoru Matsuda and Dr. Akira Watanabe at the Institute for Chemical Reaction",

year = "1994",

month = may,

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doi = "10.1016/0169-4332(94)90438-3",

language = "English",

volume = "79-80",

pages = "366--374",

journal = "Applied Surface Science",

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TY - JOUR

T1 - Laser projection CVD using the low temperature condensation method

AU - Takashima, Kohji

AU - Minami, Kazuyuki

AU - Esashi, Masayoshi

AU - Nishizawa, Jun ichi

N1 - Funding Information: This work was supported by the Japanese Ministry of Education Science and Culture under a Grant-in-Aid No. 03102001. We would like to thank Professor Minoru Matsuda and Dr. Akira Watanabe at the Institute for Chemical Reaction

PY - 1994/5/2

Y1 - 1994/5/2

N2 - Laser projection CVD using the low temperature condensation method was developed. By irradiating a cooled substrate with an ArF excimer laser in an organic gas environment, polymethylmethacrylate (PMMA), tin dioxide and silicon dioxide films were deposited selectively with a high deposition rate of about 0.1 μm min-1. Special attention was given to the silicon dioxide film in order to obtain a high deposition rate and good quality. These films can be deposited successively, being promising for the realization of stacked microstructures. This technique can be also applied where a uniform resist coating is not possible. By using this technique, the PMMA film was selectively deposited on the end of an optical fiber.

AB - Laser projection CVD using the low temperature condensation method was developed. By irradiating a cooled substrate with an ArF excimer laser in an organic gas environment, polymethylmethacrylate (PMMA), tin dioxide and silicon dioxide films were deposited selectively with a high deposition rate of about 0.1 μm min-1. Special attention was given to the silicon dioxide film in order to obtain a high deposition rate and good quality. These films can be deposited successively, being promising for the realization of stacked microstructures. This technique can be also applied where a uniform resist coating is not possible. By using this technique, the PMMA film was selectively deposited on the end of an optical fiber.

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JO - Applied Surface Science

JF - Applied Surface Science

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Laser projection CVD using the low temperature condensation method

Abstract

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