Layer-by-layer growth of precisely controlled hetero-molecular multi-layers and superlattice structures

Nobuya Hiroshiba; Jonathan P. Hill; Ryoma Hayakawa; Katsuhiko Ariga; Kiyoto Matsuishi; Yutaka Wakayama

doi:10.1016/j.tsf.2013.03.082

Layer-by-layer growth of precisely controlled hetero-molecular multi-layers and superlattice structures

Nobuya Hiroshiba, Jonathan P. Hill, Ryoma Hayakawa, Katsuhiko Ariga, Kiyoto Matsuishi, Yutaka Wakayama

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

We demonstrate a technique for growing fine molecular films on a monolayer scale. We achieve layer-by-layer growth under thermally equilibrium condition by precisely controlling the conditions of an ultra-slow deposition technique. This technique is applicable to various kinds of p-type and n-type organic semiconductors and makes it possible to form a hetero-molecular interface (p-n junction) with molecular level flatness. The technique was used to produce a molecular superlattice, which enables the well-controlled design of energy level alignments in organic semiconductors.

Original language	English
Pages (from-to)	74-77
Number of pages	4
Journal	Thin Solid Films
Volume	554
DOIs	https://doi.org/10.1016/j.tsf.2013.03.082
Publication status	Published - 2014 Mar 3

Keywords

AFM
Hetero interface
Hot-wall deposition
Molecular layers
Super lattice
X-ray reflection

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2013.03.082

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title = "Layer-by-layer growth of precisely controlled hetero-molecular multi-layers and superlattice structures",

abstract = "We demonstrate a technique for growing fine molecular films on a monolayer scale. We achieve layer-by-layer growth under thermally equilibrium condition by precisely controlling the conditions of an ultra-slow deposition technique. This technique is applicable to various kinds of p-type and n-type organic semiconductors and makes it possible to form a hetero-molecular interface (p-n junction) with molecular level flatness. The technique was used to produce a molecular superlattice, which enables the well-controlled design of energy level alignments in organic semiconductors.",

keywords = "AFM, Hetero interface, Hot-wall deposition, Molecular layers, Super lattice, X-ray reflection",

author = "Nobuya Hiroshiba and Hill, {Jonathan P.} and Ryoma Hayakawa and Katsuhiko Ariga and Kiyoto Matsuishi and Yutaka Wakayama",

year = "2014",

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doi = "10.1016/j.tsf.2013.03.082",

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TY - JOUR

T1 - Layer-by-layer growth of precisely controlled hetero-molecular multi-layers and superlattice structures

AU - Hiroshiba, Nobuya

AU - Hill, Jonathan P.

AU - Hayakawa, Ryoma

AU - Ariga, Katsuhiko

AU - Matsuishi, Kiyoto

AU - Wakayama, Yutaka

PY - 2014/3/3

Y1 - 2014/3/3

N2 - We demonstrate a technique for growing fine molecular films on a monolayer scale. We achieve layer-by-layer growth under thermally equilibrium condition by precisely controlling the conditions of an ultra-slow deposition technique. This technique is applicable to various kinds of p-type and n-type organic semiconductors and makes it possible to form a hetero-molecular interface (p-n junction) with molecular level flatness. The technique was used to produce a molecular superlattice, which enables the well-controlled design of energy level alignments in organic semiconductors.

AB - We demonstrate a technique for growing fine molecular films on a monolayer scale. We achieve layer-by-layer growth under thermally equilibrium condition by precisely controlling the conditions of an ultra-slow deposition technique. This technique is applicable to various kinds of p-type and n-type organic semiconductors and makes it possible to form a hetero-molecular interface (p-n junction) with molecular level flatness. The technique was used to produce a molecular superlattice, which enables the well-controlled design of energy level alignments in organic semiconductors.

KW - AFM

KW - Hetero interface

KW - Hot-wall deposition

KW - Molecular layers

KW - Super lattice

KW - X-ray reflection

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DO - 10.1016/j.tsf.2013.03.082

M3 - Article

AN - SCOPUS:84893902864

SN - 0040-6090

VL - 554

SP - 74

EP - 77

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Layer-by-layer growth of precisely controlled hetero-molecular multi-layers and superlattice structures

Abstract

Keywords

ASJC Scopus subject areas

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