Light scattering by submicron particles on film-coated wafers

Hideyuki Kondo, Shigenari Yanagi, Kazushige Takaishi, Takayuki Shingyouji, Tatsuo Yoshinobu, Hiroshi Iwasaki

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


The intensity of light scattered by particles on film-coated wafers was measured as a function of film thickness using two types of particle counter with different optical configurations. The scattered light intensity was found to oscillate periodically with film thickness; the period of oscillation was in agreement with that of the reflectivity of the incident beam, and significant enhancement of scattering intensity was observed for thicknesses less than about 0.3 μm.

Original languageEnglish
Pages (from-to)L616-L618
JournalJapanese Journal of Applied Physics
Issue number5 B
Publication statusPublished - 1996


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