TY - JOUR
T1 - Light scattering by submicron particles on film-coated wafers
AU - Kondo, Hideyuki
AU - Yanagi, Shigenari
AU - Takaishi, Kazushige
AU - Shingyouji, Takayuki
AU - Yoshinobu, Tatsuo
AU - Iwasaki, Hiroshi
PY - 1996
Y1 - 1996
N2 - The intensity of light scattered by particles on film-coated wafers was measured as a function of film thickness using two types of particle counter with different optical configurations. The scattered light intensity was found to oscillate periodically with film thickness; the period of oscillation was in agreement with that of the reflectivity of the incident beam, and significant enhancement of scattering intensity was observed for thicknesses less than about 0.3 μm.
AB - The intensity of light scattered by particles on film-coated wafers was measured as a function of film thickness using two types of particle counter with different optical configurations. The scattered light intensity was found to oscillate periodically with film thickness; the period of oscillation was in agreement with that of the reflectivity of the incident beam, and significant enhancement of scattering intensity was observed for thicknesses less than about 0.3 μm.
UR - http://www.scopus.com/inward/record.url?scp=0030145630&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0030145630&partnerID=8YFLogxK
U2 - 10.1143/jjap.35.l616
DO - 10.1143/jjap.35.l616
M3 - Article
AN - SCOPUS:0030145630
SN - 0021-4922
VL - 35
SP - L616-L618
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 5 B
ER -