Local structural study of Mg0.06Zn0.94O film by polarized XAFS

Tsutomu Yamada, Takafumi Miyanaga, Takashi Azuhata, Takahiro Koyama, Shigefusa F. Chichibu, Yoshinori Kitajima

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3 Citations (Scopus)


We measured the polarized X-ray absorption fine structure (XAFS) for Zn K- and Mg K-edge of Mg0.06Zn0.94 film fabricated on (112̄0) Al2O3substrate by Hericon Wave excited Plasma Sputtering Epitaxy (HWPSE) method. The local structures around Zn and Mg atoms were investigated for both vertical and horizontal directions to the sample plane. The non-linear-least-square-fitting was applied to Zn K-EXAFS (extended XAFS) and the simulation calculation was also applied to the Mg K-edge X-ray absorption near edge structure (XANES). Mg atoms are suggested to be distributed randomly in the Mg0.06Zn0.94O layer for both directions of the vertical and horizontal to the sample plane.

Original languageEnglish
Pages (from-to)596-600
Number of pages5
Journale-Journal of Surface Science and Nanotechnology
Publication statusPublished - 2009 May 9


  • Fluorescence XAFS
  • MgZnO
  • Semiconducting films


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