Low-voltage electrostatically driven nanoelectromechanical-switches

Hiro Iizuka, Takahito Ono

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

Electrostatically-driven nanoelectromechanical (NEM) switches based on silicon and tungsten as a base material are designed and fabricated by reactive ion etching using Bosch process, and their switching performances are evaluated. The NEM switches consist of three isolated electrodes, i.e. gate, drain, and nanomechanical source. A low switching voltage of 0.8 V is achieved for the Si-based switch with a flexible mechanical structure and the narrow electrode gaps of electrostatic actuators. A method for high aspect ratio etching of W using Bosch process is developed and W-based NEM switches are also developed.

Original languageEnglish
Title of host publication2015 Transducers - 2015 18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages560-563
Number of pages4
ISBN (Electronic)9781479989553
DOIs
Publication statusPublished - 2015 Aug 5
Event18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015 - Anchorage, United States
Duration: 2015 Jun 212015 Jun 25

Publication series

Name2015 Transducers - 2015 18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015

Other

Other18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015
Country/TerritoryUnited States
CityAnchorage
Period15/6/2115/6/25

Keywords

  • Bosch process
  • Electrostatic actuator
  • Nanoelectromechanical switches
  • Reactive ion etching (DRIE)

ASJC Scopus subject areas

  • Instrumentation
  • Electrical and Electronic Engineering

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