Magnetic patterning of FeRh thin films by energetic light ion microbeam irradiation

Tetsuya Koide, Takahiro Satoh, Masashi Kohka, Yuichi Saitoh, Tomohiro Kamiya, Takuo Ohkouchi, Masato Kotsugi, Toyohiko Kinoshita, Tetsuya Nakamura, Akihiro Iwase, Toshiyuki Matsui

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12 Citations (Scopus)


Magnetic patterning of FeRh thin films of various shapes and dimensions by 2MeV H and He ion microbeam irradiation was examined by X-ray magnetic circular dichroism photoemission electron microscopy (XMCD-PEEM) at the photon energy of the Fe L3 absorption edge. The XMCD-PEEM images clearly show that the various magnetic patterns whose sizes are about 1-2 μm, can be successfully produced by controlling the scan condition and the size of the ion beam probe. Furthermore, the quantitative analysis of the XMCD-PEEM images reveals that the localized magnetization in the micrometer-sized magnetic patterns significantly depends on the irradiation ion fluence. In addition, the annealing condition is also found to be one of the predominant factors that determine the magnetic state even for the micrometer-sized magnetic patterns.

Original languageEnglish
Article number05FC06
JournalJapanese Journal of Applied Physics
Issue number5 SPEC. ISSUE 1
Publication statusPublished - 2014 May


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