Magnetic patterning of FeRh thin films by energetic light ion microbeam irradiation

Tetsuya Koide; Takahiro Satoh; Masashi Kohka; Yuichi Saitoh; Tomohiro Kamiya; Takuo Ohkouchi; Masato Kotsugi; Toyohiko Kinoshita; Tetsuya Nakamura; Akihiro Iwase; Toshiyuki Matsui

doi:10.7567/JJAP.53.05FC06

Magnetic patterning of FeRh thin films by energetic light ion microbeam irradiation

Tetsuya Koide, Takahiro Satoh, Masashi Kohka, Yuichi Saitoh, Tomohiro Kamiya, Takuo Ohkouchi, Masato Kotsugi, Toyohiko Kinoshita, Tetsuya Nakamura, Akihiro Iwase, Toshiyuki Matsui

International Center for Synchrotron Radiation Innovation Smart (SRIS)

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Magnetic patterning of FeRh thin films of various shapes and dimensions by 2MeV H and He ion microbeam irradiation was examined by X-ray magnetic circular dichroism photoemission electron microscopy (XMCD-PEEM) at the photon energy of the Fe L₃ absorption edge. The XMCD-PEEM images clearly show that the various magnetic patterns whose sizes are about 1-2 μm, can be successfully produced by controlling the scan condition and the size of the ion beam probe. Furthermore, the quantitative analysis of the XMCD-PEEM images reveals that the localized magnetization in the micrometer-sized magnetic patterns significantly depends on the irradiation ion fluence. In addition, the annealing condition is also found to be one of the predominant factors that determine the magnetic state even for the micrometer-sized magnetic patterns.

Original language	English
Article number	05FC06
Journal	Japanese Journal of Applied Physics
Volume	53
Issue number	5 SPEC. ISSUE 1
DOIs	https://doi.org/10.7567/JJAP.53.05FC06
Publication status	Published - 2014 May

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title = "Magnetic patterning of FeRh thin films by energetic light ion microbeam irradiation",

abstract = "Magnetic patterning of FeRh thin films of various shapes and dimensions by 2MeV H and He ion microbeam irradiation was examined by X-ray magnetic circular dichroism photoemission electron microscopy (XMCD-PEEM) at the photon energy of the Fe L3 absorption edge. The XMCD-PEEM images clearly show that the various magnetic patterns whose sizes are about 1-2 μm, can be successfully produced by controlling the scan condition and the size of the ion beam probe. Furthermore, the quantitative analysis of the XMCD-PEEM images reveals that the localized magnetization in the micrometer-sized magnetic patterns significantly depends on the irradiation ion fluence. In addition, the annealing condition is also found to be one of the predominant factors that determine the magnetic state even for the micrometer-sized magnetic patterns.",

author = "Tetsuya Koide and Takahiro Satoh and Masashi Kohka and Yuichi Saitoh and Tomohiro Kamiya and Takuo Ohkouchi and Masato Kotsugi and Toyohiko Kinoshita and Tetsuya Nakamura and Akihiro Iwase and Toshiyuki Matsui",

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month = may,

doi = "10.7567/JJAP.53.05FC06",

language = "English",

volume = "53",

journal = "Japanese Journal of Applied Physics",

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TY - JOUR

T1 - Magnetic patterning of FeRh thin films by energetic light ion microbeam irradiation

AU - Koide, Tetsuya

AU - Satoh, Takahiro

AU - Kohka, Masashi

AU - Saitoh, Yuichi

AU - Kamiya, Tomohiro

AU - Ohkouchi, Takuo

AU - Kotsugi, Masato

AU - Kinoshita, Toyohiko

AU - Nakamura, Tetsuya

AU - Iwase, Akihiro

AU - Matsui, Toshiyuki

PY - 2014/5

Y1 - 2014/5

N2 - Magnetic patterning of FeRh thin films of various shapes and dimensions by 2MeV H and He ion microbeam irradiation was examined by X-ray magnetic circular dichroism photoemission electron microscopy (XMCD-PEEM) at the photon energy of the Fe L3 absorption edge. The XMCD-PEEM images clearly show that the various magnetic patterns whose sizes are about 1-2 μm, can be successfully produced by controlling the scan condition and the size of the ion beam probe. Furthermore, the quantitative analysis of the XMCD-PEEM images reveals that the localized magnetization in the micrometer-sized magnetic patterns significantly depends on the irradiation ion fluence. In addition, the annealing condition is also found to be one of the predominant factors that determine the magnetic state even for the micrometer-sized magnetic patterns.

AB - Magnetic patterning of FeRh thin films of various shapes and dimensions by 2MeV H and He ion microbeam irradiation was examined by X-ray magnetic circular dichroism photoemission electron microscopy (XMCD-PEEM) at the photon energy of the Fe L3 absorption edge. The XMCD-PEEM images clearly show that the various magnetic patterns whose sizes are about 1-2 μm, can be successfully produced by controlling the scan condition and the size of the ion beam probe. Furthermore, the quantitative analysis of the XMCD-PEEM images reveals that the localized magnetization in the micrometer-sized magnetic patterns significantly depends on the irradiation ion fluence. In addition, the annealing condition is also found to be one of the predominant factors that determine the magnetic state even for the micrometer-sized magnetic patterns.

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JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

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Magnetic patterning of FeRh thin films by energetic light ion microbeam irradiation

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