Magnetic Properties of Fe-Si-N Films Sputtered in (Ar+N2) Plasma

M. Takahashi, H. Komaba, H. Shoji, T. Shimatsu, T. Wakiyama

Research output: Contribution to journalArticlepeer-review


Soft magnetic properties of Fe-Si alloy films sputtered in (Ar+N2) plasma are examined, and the relations between the permeability μeff and features of the metallurgical structure such as the lattice strain and grain size, are discussed. The total magnetic anisotropy in individual crystal grains was calculated for various Fe-Si alloys by considering the magnetoelastic energy due to the experimentally determined lattice strain. Experimentally obtained changes in μeff agreed well with the calculated change in total anisotropy as a function of Si concentration and N2 flow ratio. However, given the magnitude of μefff this composition dependence of the μeff vs. N2 flow ratio is clearly a function of the grain size. It was concluded that the soft magnetic properties of Fe-Si alloy sputtered films are related to both reduction of the total anisotropy due to lattice strain from the bcc to the bet structure, and also to the grain size.

Original languageEnglish
Pages (from-to)78-84
Number of pages7
JournalIEEE Translation Journal on Magnetics in Japan
Issue number1
Publication statusPublished - 1991 Jan

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Engineering(all)


Dive into the research topics of 'Magnetic Properties of Fe-Si-N Films Sputtered in (Ar+N2) Plasma'. Together they form a unique fingerprint.

Cite this