TY - JOUR
T1 - Magnetostriction of Sm-Fe Thin Films Fabricated by a Sputtering Method
AU - Honda, T.
AU - Hayashi, Y.
AU - Yamaguchi, M.
AU - Arai, K. I.
PY - 1994
Y1 - 1994
N2 - The magnetostriction and magnetic properties of sputtered SmxFe100−x (3≤x≤54) thin films at room temperature were investigated. Films had an amorphous structure for x≥12. The magnetostriction λ of the films increased rapidly under weak fields (<1 kOe) and reached maximum values in the range 130 to 160×10−6 at 16 kOe for x=30 to 40, suggesting that Sm-Fe films can be used in microactuators and sensors. The magnetic properties did not show a clear dependence on the sputtering conditions, such as the input power, Ar gas pressure, or substrate temperature (≤250°C).
AB - The magnetostriction and magnetic properties of sputtered SmxFe100−x (3≤x≤54) thin films at room temperature were investigated. Films had an amorphous structure for x≥12. The magnetostriction λ of the films increased rapidly under weak fields (<1 kOe) and reached maximum values in the range 130 to 160×10−6 at 16 kOe for x=30 to 40, suggesting that Sm-Fe films can be used in microactuators and sensors. The magnetic properties did not show a clear dependence on the sputtering conditions, such as the input power, Ar gas pressure, or substrate temperature (≤250°C).
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U2 - 10.1109/TJMJ.1994.4565805
DO - 10.1109/TJMJ.1994.4565805
M3 - Article
AN - SCOPUS:0028368071
SN - 0882-4959
VL - 9
SP - 129
EP - 133
JO - IEEE Translation Journal on Magnetics in Japan
JF - IEEE Translation Journal on Magnetics in Japan
IS - 1
ER -