TY - JOUR
T1 - Mathematical design of linear action masks for binary and ternary composition spread film library
AU - Yamamoto, Yukio
AU - Takahashi, Ryota
AU - Matsumoto, Yuji
AU - Chikyow, Toyohiro
AU - Koinuma, Hideomi
PY - 2004/2/15
Y1 - 2004/2/15
N2 - The use of variation method for mathematical designing of mask patterns for the composition spread film was discussed. The method designs for concurrent fabrication of binary and ternary phase diagrams in which compositions of each component cover the full range of 0% to 100%. The method selects a geometric figure of the mask pattern and then numerically computes the composition gradient. The method also find its usage for the desired superlattice and devise libraries.
AB - The use of variation method for mathematical designing of mask patterns for the composition spread film was discussed. The method designs for concurrent fabrication of binary and ternary phase diagrams in which compositions of each component cover the full range of 0% to 100%. The method selects a geometric figure of the mask pattern and then numerically computes the composition gradient. The method also find its usage for the desired superlattice and devise libraries.
KW - Combinatorial technology
KW - Composition spread
KW - Ternary phase diagram
UR - http://www.scopus.com/inward/record.url?scp=0347565985&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0347565985&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2003.10.025
DO - 10.1016/j.apsusc.2003.10.025
M3 - Article
AN - SCOPUS:0347565985
SN - 0169-4332
VL - 223
SP - 9
EP - 13
JO - Applied Surface Science
JF - Applied Surface Science
IS - 1-3
ER -