Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors

Tomohiro Ogawa; Yuichiro Ezoe; Teppei Moriyama; Takaya Ohashi; Ikuyuki Mitsuishi; Kazuhisa Mitsuda; Yoshiaki Kanamori; Hitomi Yamaguchi; Raul Riveros

doi:10.1109/OMEMS.2011.6031068

Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors

Tomohiro Ogawa, Yuichiro Ezoe, Teppei Moriyama, Takaya Ohashi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Yoshiaki Kanamori, Hitomi Yamaguchi, Raul Riveros

ENG - Robotics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

A taper angle and X-ray reflectivity of MEMS-Based silicon X-ray mirrors is quantitatively measured using a parallel X-ray beam at Al K_α 1.49 keV.

Original language	English
Title of host publication	Proceedings - OMN2011
Subtitle of host publication	16th International Conference on Optical MEMS and Nanophotonics
Pages	167-168
Number of pages	2
DOIs	https://doi.org/10.1109/OMEMS.2011.6031068
Publication status	Published - 2011
Event	16th International Conference on Optical MEMS and Nanophotonics, OMN2011 - Istanbul, Turkey Duration: 2011 Aug 8 → 2011 Aug 11

Publication series

Name	International Conference on Optical MEMS and Nanophotonics
ISSN (Print)	2160-5033
ISSN (Electronic)	2160-5041

Conference

Conference	16th International Conference on Optical MEMS and Nanophotonics, OMN2011
Country/Territory	Turkey
City	Istanbul
Period	11/8/8 → 11/8/11

Keywords

annealing
DRIE
X-ray optics

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10.1109/OMEMS.2011.6031068

Cite this

Ogawa, T., Ezoe, Y., Moriyama, T., Ohashi, T., Mitsuishi, I., Mitsuda, K., Kanamori, Y., Yamaguchi, H., & Riveros, R. (2011). Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors. In Proceedings - OMN2011: 16th International Conference on Optical MEMS and Nanophotonics (pp. 167-168). Article 6031068 (International Conference on Optical MEMS and Nanophotonics). https://doi.org/10.1109/OMEMS.2011.6031068

@inproceedings{4c2745a2e513449e9899f6f9f19f9887,

title = "Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors",

abstract = "A taper angle and X-ray reflectivity of MEMS-Based silicon X-ray mirrors is quantitatively measured using a parallel X-ray beam at Al Kα 1.49 keV.",

keywords = "annealing, DRIE, X-ray optics",

author = "Tomohiro Ogawa and Yuichiro Ezoe and Teppei Moriyama and Takaya Ohashi and Ikuyuki Mitsuishi and Kazuhisa Mitsuda and Yoshiaki Kanamori and Hitomi Yamaguchi and Raul Riveros",

year = "2011",

doi = "10.1109/OMEMS.2011.6031068",

language = "English",

isbn = "9781457703362",

series = "International Conference on Optical MEMS and Nanophotonics",

pages = "167--168",

booktitle = "Proceedings - OMN2011",

note = "16th International Conference on Optical MEMS and Nanophotonics, OMN2011 ; Conference date: 08-08-2011 Through 11-08-2011",

}

Ogawa, T, Ezoe, Y, Moriyama, T, Ohashi, T, Mitsuishi, I, Mitsuda, K, Kanamori, Y, Yamaguchi, H & Riveros, R 2011, Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors. in Proceedings - OMN2011: 16th International Conference on Optical MEMS and Nanophotonics., 6031068, International Conference on Optical MEMS and Nanophotonics, pp. 167-168, 16th International Conference on Optical MEMS and Nanophotonics, OMN2011, Istanbul, Turkey, 11/8/8. https://doi.org/10.1109/OMEMS.2011.6031068

Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors. / Ogawa, Tomohiro; Ezoe, Yuichiro; Moriyama, Teppei et al.
Proceedings - OMN2011: 16th International Conference on Optical MEMS and Nanophotonics. 2011. p. 167-168 6031068 (International Conference on Optical MEMS and Nanophotonics).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors

AU - Ogawa, Tomohiro

AU - Ezoe, Yuichiro

AU - Moriyama, Teppei

AU - Ohashi, Takaya

AU - Mitsuishi, Ikuyuki

AU - Mitsuda, Kazuhisa

AU - Kanamori, Yoshiaki

AU - Yamaguchi, Hitomi

AU - Riveros, Raul

PY - 2011

Y1 - 2011

N2 - A taper angle and X-ray reflectivity of MEMS-Based silicon X-ray mirrors is quantitatively measured using a parallel X-ray beam at Al Kα 1.49 keV.

AB - A taper angle and X-ray reflectivity of MEMS-Based silicon X-ray mirrors is quantitatively measured using a parallel X-ray beam at Al Kα 1.49 keV.

KW - annealing

KW - DRIE

KW - X-ray optics

UR - http://www.scopus.com/inward/record.url?scp=82955168347&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=82955168347&partnerID=8YFLogxK

U2 - 10.1109/OMEMS.2011.6031068

DO - 10.1109/OMEMS.2011.6031068

M3 - Conference contribution

AN - SCOPUS:82955168347

SN - 9781457703362

T3 - International Conference on Optical MEMS and Nanophotonics

SP - 167

EP - 168

BT - Proceedings - OMN2011

T2 - 16th International Conference on Optical MEMS and Nanophotonics, OMN2011

Y2 - 8 August 2011 through 11 August 2011

ER -

Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors

Abstract

Publication series

Conference

Keywords

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