Measurement Of Vapor-Liquid Equilibria At Elevated Temperatures And Pressures Using A Flow Type Apparatus

Hiroshi Inomata; Kazuhiro Tuchiya; Kunio Arai; Shozaburo Saito

doi:10.1252/jcej.19.386

Measurement Of Vapor-Liquid Equilibria At Elevated Temperatures And Pressures Using A Flow Type Apparatus

Hiroshi Inomata, Kazuhiro Tuchiya, Kunio Arai, Shozaburo Saito

New Industry Creation Hatchery Center (NICHe)

Tohoku University

Research output: Contribution to journal › Article › peer-review

43 Citations (Scopus)

Abstract

A new flow-type apparatus was developed using an overflow-type liquid level self-control system and a back pressure regulator. The present apparatus makes possible vapor-liquid equilibrium measurements at high temperatures by minimizing the residence time of heat-sensitive substances. It was shown that the resulting vapor-and liquid-phase compositions were independent of the sample flow rate within the range of flow rates employed. Vapor-liquid equilibrium data were measured with this apparatus for the systems C0₂-«-heptane, C0₂-«-decane, C0₂-trans-decaIin, C0₂-tetralin, C0₂-quinoline, benzene-tetralin and benzene-quinoline in the temperature range from 340 to 710 K at several pressures up to 23 MPa.

Original language	English
Pages (from-to)	386-391
Number of pages	6
Journal	Journal of Chemical Engineering of Japan
Volume	19
Issue number	5
DOIs	https://doi.org/10.1252/jcej.19.386
Publication status	Published - 1986

Keywords

Flow Type
High Pressure
High Temperature
Phase Equilibrium
Thermodynamics

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10.1252/jcej.19.386

Cite this

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abstract = "A new flow-type apparatus was developed using an overflow-type liquid level self-control system and a back pressure regulator. The present apparatus makes possible vapor-liquid equilibrium measurements at high temperatures by minimizing the residence time of heat-sensitive substances. It was shown that the resulting vapor-and liquid-phase compositions were independent of the sample flow rate within the range of flow rates employed. Vapor-liquid equilibrium data were measured with this apparatus for the systems C02-«-heptane, C02-«-decane, C02-trans-decaIin, C02-tetralin, C02-quinoline, benzene-tetralin and benzene-quinoline in the temperature range from 340 to 710 K at several pressures up to 23 MPa.",

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author = "Hiroshi Inomata and Kazuhiro Tuchiya and Kunio Arai and Shozaburo Saito",

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AU - Inomata, Hiroshi

AU - Tuchiya, Kazuhiro

AU - Arai, Kunio

AU - Saito, Shozaburo

PY - 1986

Y1 - 1986

N2 - A new flow-type apparatus was developed using an overflow-type liquid level self-control system and a back pressure regulator. The present apparatus makes possible vapor-liquid equilibrium measurements at high temperatures by minimizing the residence time of heat-sensitive substances. It was shown that the resulting vapor-and liquid-phase compositions were independent of the sample flow rate within the range of flow rates employed. Vapor-liquid equilibrium data were measured with this apparatus for the systems C02-«-heptane, C02-«-decane, C02-trans-decaIin, C02-tetralin, C02-quinoline, benzene-tetralin and benzene-quinoline in the temperature range from 340 to 710 K at several pressures up to 23 MPa.

AB - A new flow-type apparatus was developed using an overflow-type liquid level self-control system and a back pressure regulator. The present apparatus makes possible vapor-liquid equilibrium measurements at high temperatures by minimizing the residence time of heat-sensitive substances. It was shown that the resulting vapor-and liquid-phase compositions were independent of the sample flow rate within the range of flow rates employed. Vapor-liquid equilibrium data were measured with this apparatus for the systems C02-«-heptane, C02-«-decane, C02-trans-decaIin, C02-tetralin, C02-quinoline, benzene-tetralin and benzene-quinoline in the temperature range from 340 to 710 K at several pressures up to 23 MPa.

KW - Flow Type

KW - High Pressure

KW - High Temperature

KW - Phase Equilibrium

KW - Thermodynamics

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Measurement Of Vapor-Liquid Equilibria At Elevated Temperatures And Pressures Using A Flow Type Apparatus

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Keywords

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