TY - JOUR
T1 - Mechanical quality factor enhancement in a silicon micromechanical resonator by low-damage process using neutral beam etching technology
AU - Van Toan, Nguyen
AU - Kubota, Tomohiro
AU - Sekhar, Halubai
AU - Samukawa, Seiji
AU - Ono, Takahito
PY - 2014/8/1
Y1 - 2014/8/1
N2 - The fabrication and evaluation of silicon micromechanical resonators using neutral beam etching (NBE) technology is presented. An etching technique based on a low energy neutral beam of Cl2/F2/O2 is introduced for making nano-trench patterns on 5 μ
AB - The fabrication and evaluation of silicon micromechanical resonators using neutral beam etching (NBE) technology is presented. An etching technique based on a low energy neutral beam of Cl2/F2/O2 is introduced for making nano-trench patterns on 5 μ
KW - deep reactive ion etching
KW - neutral beam etching technology
KW - silicon micromechanical resonator
KW - silicon on insulator
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UR - http://www.scopus.com/inward/citedby.url?scp=84906099207&partnerID=8YFLogxK
U2 - 10.1088/0960-1317/24/8/085005
DO - 10.1088/0960-1317/24/8/085005
M3 - Article
AN - SCOPUS:84906099207
SN - 0960-1317
VL - 24
JO - Journal of Micromechanics and Microengineering
JF - Journal of Micromechanics and Microengineering
IS - 8
M1 - 085005
ER -