TY - GEN
T1 - Mechanical strengthening of silicon torsion bar of MEMS scanning mirror by hydrogen anneal
AU - Hajika, R.
AU - Yoshida, S.
AU - Makishi, W.
AU - Kanamori, Y.
AU - Tanaka, S.
AU - Esashi, M.
PY - 2013
Y1 - 2013
N2 - This paper reports on the strengthening effect of hydrogen anneal on torsional fracture strength of single crystal silicon (SCS). Moving-magnet-type MEMS mirrors were prepared by fabricating SCS and silicon on insulator (SOI) wafers via deep reactive ion etching (DRIE) as fracture test specimens. As a result of the fracture test of the torsion bar on the mirrors, the torsion bar fabricated using a SCS wafer could be strengthened to about 4 times in average by hydrogen anneal. By contrast, that using a SOI wafer was weaken to half. This mechanical strengthening effect has the potential ability to provide highly-reliable and tough SCS-based MEMS devices.
AB - This paper reports on the strengthening effect of hydrogen anneal on torsional fracture strength of single crystal silicon (SCS). Moving-magnet-type MEMS mirrors were prepared by fabricating SCS and silicon on insulator (SOI) wafers via deep reactive ion etching (DRIE) as fracture test specimens. As a result of the fracture test of the torsion bar on the mirrors, the torsion bar fabricated using a SCS wafer could be strengthened to about 4 times in average by hydrogen anneal. By contrast, that using a SOI wafer was weaken to half. This mechanical strengthening effect has the potential ability to provide highly-reliable and tough SCS-based MEMS devices.
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U2 - 10.1109/MEMSYS.2013.6474269
DO - 10.1109/MEMSYS.2013.6474269
M3 - Conference contribution
AN - SCOPUS:84875431986
SN - 9781467356558
T3 - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
SP - 425
EP - 428
BT - IEEE 26th International Conference on Micro Electro Mechanical Systems, MEMS 2013
T2 - IEEE 26th International Conference on Micro Electro Mechanical Systems, MEMS 2013
Y2 - 20 January 2013 through 24 January 2013
ER -