Abstract
To decrease the grain size and grain size distribution in longitudinal media, a small amount of oxygen exposure onto either normal NiP or Co co-precipitated Co-NiP/Al-alloy substrates has been used. The substrate surfaces of both media were dryetched by RF-plasma prior to oxygen exposure. The exposure of 3.5 L of oxygen onto the normal NiP substrate surface reduces the grain diameter from 10.0 nm to 8.8 nm while maintaining the standard distribution of grain diameter of about 1.4 nm. As the results, the media signal to noise ratio increases by 0.6 dB. By adding 400 ppm of Co into NiP plated substrate and combined with 1.5 L of oxygen exposure, the grain diameter and the standard distribution of grain diameter decrease from 9.2 nm to 8.3 nm. As the results, the media signal to noise ratio increases by 1.0 dB.
Original language | English |
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Pages (from-to) | 2363-2365 |
Number of pages | 3 |
Journal | IEEE Transactions on Magnetics |
Volume | 36 |
Issue number | 5 I |
DOIs | |
Publication status | Published - 2000 Sept |
Externally published | Yes |
Event | 2000 International Magnetics Conference (INTERMAG 2000) - Toronto, Ont, Canada Duration: 2000 Apr 9 → 2000 Apr 12 |
Keywords
- Co co-precipitated NiP/Al substrate
- Dry-etching
- Oxygen exposure
- Thin film media
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering