Metallic pattern fabrication in organic Mott insulating crystal by local X-ray irradiation

Naoki Yoneyama, Takahiko Sasaki, Norio Kobayashi, Yuka Ikemoto, Taro Moriwaki, Hiroaki Kimura

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

We have fabricated a metallic structure in an organic Mott insulator κ-(BEDT-TTF)2Cu[N(CN)2]Cl. The periodic metallic domains of approximately 90×90 μm2 obtained by X-ray irradiation through a molybdenum mesh mask are visualized by scanning microregion infrared reflectance spectroscopy technique. No deterioration by irradiation is found in a range of nanometer to micrometer scales. We demonstrate that the present processing method is applicable for the fabrication of molecular electronic devices.

Original languageEnglish
Pages (from-to)775-777
Number of pages3
JournalSolid State Communications
Volume149
Issue number19-20
DOIs
Publication statusPublished - 2009 May

Keywords

  • A. Organic crystals
  • A. Superconductors
  • D. Radiation effects

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