Method for measuring polarity-inverted layered structure in dielectric thin films using scanning nonlinear dielectric microscopy

Hiroyuki Odagawa, Koshiro Terada, Hiroaki Nishikawa, Takahiko Yanagitani, Yasuo Cho

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A method for obtaining a depth profile of polarity inverted structure in a layered ferroelectric and/or piezoelectric thin film is proposed. It is performed by surface measurement non-destructively using scanning nonlinear dielectric microscopy. We describe estimation principle for the depth profile with some calculation results of measurement signal, which is related to tip radius of the measurement probe and depth of the inverted layer. Also, experimental results in zinc oxide films which have layered polarity-inverted structure fabricated by radio frequency magnetron sputtering and the estimation of the polarity state on the films are shown.

Original languageEnglish
Pages (from-to)47-51
Number of pages5
JournalFerroelectrics
Volume498
Issue number1
DOIs
Publication statusPublished - 2016 Aug 31

Keywords

  • non-destructive measurement
  • polarity inverted structure
  • polarity measurement
  • Scanning nonlinear dielectric microscopy

Fingerprint

Dive into the research topics of 'Method for measuring polarity-inverted layered structure in dielectric thin films using scanning nonlinear dielectric microscopy'. Together they form a unique fingerprint.

Cite this