Micro inductor for flip chip micro power source

E. Sugawara; N. Wakou; F. Sato; H. Matsuki; M. Yamaguchi; K. Shirakawa; T. Masumoto

Micro inductor for flip chip micro power source

E. Sugawara, N. Wakou, F. Sato, H. Matsuki, M. Yamaguchi, K. Shirakawa, T. Masumoto

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

Abstract

A new micro inductor with a thickness of 300 μm was developed by using power MEMS and continuous deposition technology. The high-quality, superior dc-biased properties of the low height micro inductors for flip chip micro power sources was also described. The efficiency and dc-biased properties of the inductors and the dispersion of the magnetic flux was investigated and calculated.

Original language	English
Pages (from-to)	EA05
Journal	Digests of the Intermag Conference
Publication status	Published - 2003
Event	Intermag 2003: International Magnetics Conference - Boston, MA, United States Duration: 2003 Mar 28 → 2003 Apr 3

Cite this

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title = "Micro inductor for flip chip micro power source",

abstract = "A new micro inductor with a thickness of 300 μm was developed by using power MEMS and continuous deposition technology. The high-quality, superior dc-biased properties of the low height micro inductors for flip chip micro power sources was also described. The efficiency and dc-biased properties of the inductors and the dispersion of the magnetic flux was investigated and calculated.",

author = "E. Sugawara and N. Wakou and F. Sato and H. Matsuki and M. Yamaguchi and K. Shirakawa and T. Masumoto",

year = "2003",

language = "English",

pages = "EA05",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Intermag 2003: International Magnetics Conference ; Conference date: 28-03-2003 Through 03-04-2003",

}

TY - JOUR

T1 - Micro inductor for flip chip micro power source

AU - Sugawara, E.

AU - Wakou, N.

AU - Sato, F.

AU - Matsuki, H.

AU - Yamaguchi, M.

AU - Shirakawa, K.

AU - Masumoto, T.

PY - 2003

Y1 - 2003

N2 - A new micro inductor with a thickness of 300 μm was developed by using power MEMS and continuous deposition technology. The high-quality, superior dc-biased properties of the low height micro inductors for flip chip micro power sources was also described. The efficiency and dc-biased properties of the inductors and the dispersion of the magnetic flux was investigated and calculated.

AB - A new micro inductor with a thickness of 300 μm was developed by using power MEMS and continuous deposition technology. The high-quality, superior dc-biased properties of the low height micro inductors for flip chip micro power sources was also described. The efficiency and dc-biased properties of the inductors and the dispersion of the magnetic flux was investigated and calculated.

UR - http://www.scopus.com/inward/record.url?scp=0141679318&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0141679318&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0141679318

SN - 0074-6843

SP - EA05

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

T2 - Intermag 2003: International Magnetics Conference

Y2 - 28 March 2003 through 3 April 2003

ER -

Micro inductor for flip chip micro power source

Abstract

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