Micro proximity electron source for nanoprocessing in atmosphere

Wonje Cho; Takahito Ono; Phan Ngoc Minh; Masayoshi Esashi

Micro proximity electron source for nanoprocessing in atmosphere

Wonje Cho, Takahito Ono, Phan Ngoc Minh, Masayoshi Esashi

ENG - Mechanical Systems Engineering

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

We have designed and fabricated a miniature proximity electron source, which can be used in atmosphere for future high density data storage or electron beam direct lithography. Carbon nanocoils (CNCs) grown on silicon are adopted as electron emitters because of their excellent field emission properties. Electrons are transmitted from a vacuum-sealed cavity to atmosphere through a thin film called as an electron window. As the membrane of the electron window, an ultrathin silicon film is chosen. The submicron diameter of the window will make narrow exuded electron distribution. We propose the concept and design of the device and report on the result of fabrication and measurements of the emission characteristics of CNCs.

Original language	English
Pages (from-to)	875-878
Number of pages	4
Journal	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Publication status	Published - 2005
Event	18th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2005 Miami - Miami Beach, FL, United States Duration: 2005 Jan 30 → 2005 Feb 3

Cite this

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title = "Micro proximity electron source for nanoprocessing in atmosphere",

abstract = "We have designed and fabricated a miniature proximity electron source, which can be used in atmosphere for future high density data storage or electron beam direct lithography. Carbon nanocoils (CNCs) grown on silicon are adopted as electron emitters because of their excellent field emission properties. Electrons are transmitted from a vacuum-sealed cavity to atmosphere through a thin film called as an electron window. As the membrane of the electron window, an ultrathin silicon film is chosen. The submicron diameter of the window will make narrow exuded electron distribution. We propose the concept and design of the device and report on the result of fabrication and measurements of the emission characteristics of CNCs.",

author = "Wonje Cho and Takahito Ono and Minh, {Phan Ngoc} and Masayoshi Esashi",

year = "2005",

language = "English",

pages = "875--878",

journal = "Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)",

issn = "1084-6999",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "18th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2005 Miami ; Conference date: 30-01-2005 Through 03-02-2005",

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TY - JOUR

T1 - Micro proximity electron source for nanoprocessing in atmosphere

AU - Cho, Wonje

AU - Ono, Takahito

AU - Minh, Phan Ngoc

AU - Esashi, Masayoshi

PY - 2005

Y1 - 2005

N2 - We have designed and fabricated a miniature proximity electron source, which can be used in atmosphere for future high density data storage or electron beam direct lithography. Carbon nanocoils (CNCs) grown on silicon are adopted as electron emitters because of their excellent field emission properties. Electrons are transmitted from a vacuum-sealed cavity to atmosphere through a thin film called as an electron window. As the membrane of the electron window, an ultrathin silicon film is chosen. The submicron diameter of the window will make narrow exuded electron distribution. We propose the concept and design of the device and report on the result of fabrication and measurements of the emission characteristics of CNCs.

AB - We have designed and fabricated a miniature proximity electron source, which can be used in atmosphere for future high density data storage or electron beam direct lithography. Carbon nanocoils (CNCs) grown on silicon are adopted as electron emitters because of their excellent field emission properties. Electrons are transmitted from a vacuum-sealed cavity to atmosphere through a thin film called as an electron window. As the membrane of the electron window, an ultrathin silicon film is chosen. The submicron diameter of the window will make narrow exuded electron distribution. We propose the concept and design of the device and report on the result of fabrication and measurements of the emission characteristics of CNCs.

UR - http://www.scopus.com/inward/record.url?scp=26844495295&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=26844495295&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:26844495295

SN - 1084-6999

SP - 875

EP - 878

JO - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

JF - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

T2 - 18th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2005 Miami

Y2 - 30 January 2005 through 3 February 2005

ER -

Micro proximity electron source for nanoprocessing in atmosphere

Abstract

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