Microbubble: Fundamental properties and application for semiconductor cleaning

Research output: Contribution to journalReview articlepeer-review

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)636-640
Number of pages5
JournalJournal of the Japan Society for Precision Engineering
Volume83
Issue number7
DOIs
Publication statusPublished - 2017

Keywords

  • Cleaning
  • Hydroxyl radicals
  • Microbubble
  • Semiconductor
  • Zeta potential

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