Microchannels: High-Aspect-Ratio Parallel-Plate Microchannels Applicable to Kinetic Analysis of Chemical Vapor Deposition (Adv. Mater. Interfaces 16/2016)

Kohei Shima, Yuichi Funato, Hidetoshi Sugiura, Noboru Sato, Yasuyuki Fukushima, Takeshi Momose, Yukihiro Shimogaki

Research output: Contribution to journalComment/debatepeer-review

3 Citations (Scopus)
Original languageEnglish
JournalAdvanced Materials Interfaces
Volume3
Issue number16
DOIs
Publication statusPublished - 2016 Aug 19
Externally publishedYes

Keywords

  • chemical vapor deposition
  • high-aspect-ratio feature
  • silicon carbides
  • sticking probability
  • test structures

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering

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