Microstructure and dielectric properties of barium titanate film prepared by MOCVD

Tetsuro Tohma, Hiroshi Masumoto, Takashi Goto

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)


Barium titanate (BaTiO3) films were prepared on (100)Pt/(100)MgO substrates by metal-organic chemical vapor deposition (MOCVD). The effects of deposition temperature (Tdep) and O2 partial pressure (PO2) on the microstructure and dielectric properties of the films were investigated. The BaTiO3 films prepared at Tdep 873 K showed a randomly orientated granular structure, while those prepared at Tdep = 973 K showed a significant (001) orientation with a columnar structure. The grain size was strongly affected by PO2 and showed the maximum at PO2 = 66 to 93 Pa. The dielectric constant increased from 93 to 640 with increasing grain size from 20 to 130 nm, showing a broad peak at 350 to 380 K.

Original languageEnglish
Pages (from-to)2880-2884
Number of pages5
JournalMaterials Transactions
Issue number11
Publication statusPublished - 2002 Nov


  • Barium titanate
  • Dielectric constant
  • Film
  • Grain size
  • Metal-organic chemical vapor deposition
  • Microstructure


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