Mitigation of accumulated electric charge by deposited fluorocarbon film during SiO₂ etching

Physics

• Electric Potential 50%
• Wafer 50%
• Plasma Jet 50%
• Ion Irradiation 50%
• Plasma Etching 50%
• Electric Charge 50%
• Deposition 50%
• Etching 50%
• Accumulations 50%

Engineering

• Surface Region 100%
• Electric Potential 50%
• Electric Charge 50%

Material Science

• Liquid Films 100%
• Plasma Etching 50%
• Etching 50%