TY - JOUR
T1 - Molecular beam epitaxy and properties of ferromagnetic III-V semiconductors
AU - Ohno, Hideo
N1 - Funding Information:
I am grateful for fruitful collaborations and discussions with a number of colleagues; among them are F. Matsukura, Y. Ohno, and T. Dietl. This work was partly supported by a Grant-in-Aid (No. 12305001) and the Research for the Future Program both from JSPS, and partly by the IT-Program of Research Revolution 2002 (RR2002) from MEXT.
PY - 2003/4
Y1 - 2003/4
N2 - Low-temperature molecular beam epitaxy has enabled synthesis of magnetic III-V semiconductors that can be epitaxially integrated into nonmagnetic III-V heterostructures. Carrier-induced ferromagnetism in these magnetic III-Vs has allowed us to explore spin-dependent phenomena previously not accessible in semiconductors. I review preparation and properties of ferromagnetic III-Vs together with isothermal and reversible electric field control of ferromagnetism.
AB - Low-temperature molecular beam epitaxy has enabled synthesis of magnetic III-V semiconductors that can be epitaxially integrated into nonmagnetic III-V heterostructures. Carrier-induced ferromagnetism in these magnetic III-Vs has allowed us to explore spin-dependent phenomena previously not accessible in semiconductors. I review preparation and properties of ferromagnetic III-Vs together with isothermal and reversible electric field control of ferromagnetism.
KW - A3. Molecular beam epitaxy
KW - B2. Magnetic materials
KW - B2. Semiconducting III-V materials
KW - B3. Heterojunction semiconductor devices
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U2 - 10.1016/S0022-0248(02)02290-X
DO - 10.1016/S0022-0248(02)02290-X
M3 - Conference article
AN - SCOPUS:0037380410
SN - 0022-0248
VL - 251
SP - 285
EP - 291
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
IS - 1-4
T2 - Proceedings of the Molecular Beam Epitaxy 2002
Y2 - 15 September 2002 through 20 September 2002
ER -