Abstract
We report the electrical characteristics of gold nanogap devices modified by conjugated molecules with thiol endgroups. Gold nanogap electrodes with a nominal gap distance of between 1-2nm were fabricated by double oblique deposition from opposite directions. The electrodes were then immersed in 4,4′-p-terphenyldithiol (TPDT) solutions to enhance conductance. Using the substrate as a gate electrode, we observed a large Coulomb diamond at room temperature with a charging energy as large as 0.25 eV. The characteristics of the device can be explained on the basis of a multi-metallic-island system. It is considered that ultra small gold islands are formed during the metal deposition and that the molecules bridging metallic islands and electrodes work as tunnel junctions.
Original language | English |
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Pages (from-to) | 4285-4289 |
Number of pages | 5 |
Journal | Japanese Journal of Applied Physics |
Volume | 45 |
Issue number | 5 A |
DOIs | |
Publication status | Published - 2006 May 9 |
Keywords
- Coulomb blockade
- Molecular devices
- Nanogap electrodes
- Self-assembled monolayers (SAMs)
- Single-electron transistors (SETs)