TY - JOUR
T1 - Morphological changes in ultraviolet-nanoimprinted resin patterns caused by ultraviolet-curable resins absorbing pentafluoropropane
AU - Kaneko, Shu
AU - Kobayashi, Kei
AU - Tsukidate, Yoshitaka
AU - Hiroshima, Hiroshi
AU - Matsui, Shinji
AU - Nakagawa, Masaru
PY - 2012/6
Y1 - 2012/6
N2 - In this article, we revealed the maximum values of pentafluoropropane (PFP) absorbed by acrylate-type monomers and UV-curable resins causing radical photopolymerization and measured the viscosities in a state saturated with PFP. We described the influences of PFP condensable gas effectively used in UV nanoimprinting on the morphologies of resin patterns fabricated by UV nanoimprinting. The weights of the resins and monomers were increased by exposure to a PFP atmosphere, while the viscosities were reduced markedly. The absorption of PFP depended on the chemical structures of the monomers. The solubility parameter calculated by the Hoy method clearly suggested that the monomer with a solubility parameter of 20 (Jcm -3) 1/2 absorbed the most PFP. The UV-curable resin composed of the monomer absorbing a large amount of PFP resulted in morphological changes in nanoimprinted resin patterns where the height was lowered and the outermost surface became rough. The UV-curable resins having hydroxyl groups play an important role in preserving the size fidelity of UV-nanoimprinted resin patterns.
AB - In this article, we revealed the maximum values of pentafluoropropane (PFP) absorbed by acrylate-type monomers and UV-curable resins causing radical photopolymerization and measured the viscosities in a state saturated with PFP. We described the influences of PFP condensable gas effectively used in UV nanoimprinting on the morphologies of resin patterns fabricated by UV nanoimprinting. The weights of the resins and monomers were increased by exposure to a PFP atmosphere, while the viscosities were reduced markedly. The absorption of PFP depended on the chemical structures of the monomers. The solubility parameter calculated by the Hoy method clearly suggested that the monomer with a solubility parameter of 20 (Jcm -3) 1/2 absorbed the most PFP. The UV-curable resin composed of the monomer absorbing a large amount of PFP resulted in morphological changes in nanoimprinted resin patterns where the height was lowered and the outermost surface became rough. The UV-curable resins having hydroxyl groups play an important role in preserving the size fidelity of UV-nanoimprinted resin patterns.
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U2 - 10.1143/JJAP.51.06FJ05
DO - 10.1143/JJAP.51.06FJ05
M3 - Article
AN - SCOPUS:84863325280
SN - 0021-4922
VL - 51
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 6 PART 2
M1 - 06FJ05
ER -