TY - JOUR
T1 - Multiscale simulation of cluster growth and deposition processes by hybrid model based on direct simulation Monte Carlo method
AU - Mizuseki, Hiroshi
AU - Hongo, Kenta
AU - Kawazoe, Yoshiyuki
AU - Wille, Luc T.
N1 - Funding Information:
The authors would like to express their sincere thanks to the crew of Center for Computational Materials Science of the Institute for Materials Research, Tohoku University for their continuous support of the SR8000-G1/64 supercomputing facilities. This research is partially supported by the Ministry of Education, Culture, Sports, Science and Technology in the form of a Grant-in-Aid for Scientific Research (C), 11650714, 1999.
PY - 2002/5
Y1 - 2002/5
N2 - A cluster growth and deposition model based on hybrid modeling is introduced to examine the experimental conditions of the cluster growth process in vacuum chamber and deposition process on substrate. This hybrid model is a simulation method including physical length and time scale characteristics of macro and microscale. We simulated the behavior of the cluster during the flight path by direct simulation Monte Carlo (DSMC) method and the deposition behavior on the substrate by a simple MC model. Several size distributions of the clusters and various morphologies of deposited film were obtained, and the relationship between macroscopic and microscopic physical phenomena during deposition process was examined.
AB - A cluster growth and deposition model based on hybrid modeling is introduced to examine the experimental conditions of the cluster growth process in vacuum chamber and deposition process on substrate. This hybrid model is a simulation method including physical length and time scale characteristics of macro and microscale. We simulated the behavior of the cluster during the flight path by direct simulation Monte Carlo (DSMC) method and the deposition behavior on the substrate by a simple MC model. Several size distributions of the clusters and various morphologies of deposited film were obtained, and the relationship between macroscopic and microscopic physical phenomena during deposition process was examined.
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U2 - 10.1016/S0927-0256(02)00168-4
DO - 10.1016/S0927-0256(02)00168-4
M3 - Article
AN - SCOPUS:0036577016
SN - 0927-0256
VL - 24
SP - 88
EP - 92
JO - Computational Materials Science
JF - Computational Materials Science
IS - 1-2
ER -