Abstract
Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large supercooled liquid region (ΔTx ≤ 95K), very smooth surface (R a ≤ 0.2nm) and high value of Vickers hardness (Hv ≤ 940) were deposited by sputtering. The micro/nano-patterning ability of these films is demonstrated by focused ion beam etching (smallest pattern ∼12nm), as well as by the imprint lithography technique (smallest feature ∼34nm). These glassy films having very good mechanical and chemical properties, combined with superb nano-patterning ability, integrateable with silicon integrated circuit technology, are promising for fabrication of a wide range of two-or three-dimensional components for future nano-electromechanical systems.
Original language | English |
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Article number | 035302 |
Journal | Nanotechnology |
Volume | 18 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2007 Jan 24 |