Nanocrystalline films of silicon carbonitride: Chemical composition and bonding and functional properties

N. I. Fainer; M. L. Kosinova; Yu M. Rumyantsev; E. A. Maximovskii; B. M. Ayupov; B. A. Kolesov; F. A. Kuznetsov; V. G. Kesler; M. Terauchi; K. Shibata; F. Satoh; Z. X. Cao

Nanocrystalline films of silicon carbonitride: Chemical composition and bonding and functional properties

N. I. Fainer, M. L. Kosinova, Yu M. Rumyantsev, E. A. Maximovskii, B. M. Ayupov, B. A. Kolesov, F. A. Kuznetsov, V. G. Kesler, M. Terauchi, K. Shibata, F. Satoh, Z. X. Cao

IMRAM - Division of Measurements

Research output: Contribution to conference › Paper › peer-review

6 Citations (Scopus)

Abstract

Nanocrystalline hard silicon carbonitride films were synthesized by RPECVD using the gas mixture of hexamethyldisilazane with ammonia and helium within temperature range of 723-1073 K. IR and Raman spectroscopy, AES, XPS, ellipsometry, XRD using the synchrotron radiation, SEM, HREM, SAED, AFM, measurements of hardness by nanoindenter and spectrophotometry measurements were applied to study their physicochemical properties. The SiC_xN _y films exhibit high optical transmittance in the spectra range of 1200-2200 nm. Microhardness of these films increases from 18 to 28 GPa, while Young's modulus changes from 135.5 to 185.5 GPa with Si-C bonds content.

Original language	English
Pages	1074-1081
Number of pages	8
Publication status	Published - 2005
Event	15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany Duration: 2005 Sept 5 → 2005 Sept 9

Conference

Conference	15th European Conference on Chemical Vapor Deposition, EUROCVD-15
Country/Territory	Germany
City	Bochum
Period	05/9/5 → 05/9/9

Cite this

Fainer, N. I., Kosinova, M. L., Rumyantsev, Y. M., Maximovskii, E. A., Ayupov, B. M., Kolesov, B. A., Kuznetsov, F. A., Kesler, V. G., Terauchi, M., Shibata, K., Satoh, F., & Cao, Z. X. (2005). Nanocrystalline films of silicon carbonitride: Chemical composition and bonding and functional properties. 1074-1081. Paper presented at 15th European Conference on Chemical Vapor Deposition, EUROCVD-15, Bochum, Germany.

@conference{386429be651b4eec939e35fbdd287a15,

title = "Nanocrystalline films of silicon carbonitride: Chemical composition and bonding and functional properties",

abstract = "Nanocrystalline hard silicon carbonitride films were synthesized by RPECVD using the gas mixture of hexamethyldisilazane with ammonia and helium within temperature range of 723-1073 K. IR and Raman spectroscopy, AES, XPS, ellipsometry, XRD using the synchrotron radiation, SEM, HREM, SAED, AFM, measurements of hardness by nanoindenter and spectrophotometry measurements were applied to study their physicochemical properties. The SiCxN y films exhibit high optical transmittance in the spectra range of 1200-2200 nm. Microhardness of these films increases from 18 to 28 GPa, while Young's modulus changes from 135.5 to 185.5 GPa with Si-C bonds content.",

author = "Fainer, {N. I.} and Kosinova, {M. L.} and Rumyantsev, {Yu M.} and Maximovskii, {E. A.} and Ayupov, {B. M.} and Kolesov, {B. A.} and Kuznetsov, {F. A.} and Kesler, {V. G.} and M. Terauchi and K. Shibata and F. Satoh and Cao, {Z. X.}",

year = "2005",

language = "English",

pages = "1074--1081",

note = "15th European Conference on Chemical Vapor Deposition, EUROCVD-15 ; Conference date: 05-09-2005 Through 09-09-2005",

}

Fainer, NI, Kosinova, ML, Rumyantsev, YM, Maximovskii, EA, Ayupov, BM, Kolesov, BA, Kuznetsov, FA, Kesler, VG, Terauchi, M, Shibata, K, Satoh, F & Cao, ZX 2005, 'Nanocrystalline films of silicon carbonitride: Chemical composition and bonding and functional properties', Paper presented at 15th European Conference on Chemical Vapor Deposition, EUROCVD-15, Bochum, Germany, 05/9/5 - 05/9/9 pp. 1074-1081.

TY - CONF

T1 - Nanocrystalline films of silicon carbonitride

T2 - 15th European Conference on Chemical Vapor Deposition, EUROCVD-15

AU - Fainer, N. I.

AU - Kosinova, M. L.

AU - Rumyantsev, Yu M.

AU - Maximovskii, E. A.

AU - Ayupov, B. M.

AU - Kolesov, B. A.

AU - Kuznetsov, F. A.

AU - Kesler, V. G.

AU - Terauchi, M.

AU - Shibata, K.

AU - Satoh, F.

AU - Cao, Z. X.

PY - 2005

Y1 - 2005

N2 - Nanocrystalline hard silicon carbonitride films were synthesized by RPECVD using the gas mixture of hexamethyldisilazane with ammonia and helium within temperature range of 723-1073 K. IR and Raman spectroscopy, AES, XPS, ellipsometry, XRD using the synchrotron radiation, SEM, HREM, SAED, AFM, measurements of hardness by nanoindenter and spectrophotometry measurements were applied to study their physicochemical properties. The SiCxN y films exhibit high optical transmittance in the spectra range of 1200-2200 nm. Microhardness of these films increases from 18 to 28 GPa, while Young's modulus changes from 135.5 to 185.5 GPa with Si-C bonds content.

AB - Nanocrystalline hard silicon carbonitride films were synthesized by RPECVD using the gas mixture of hexamethyldisilazane with ammonia and helium within temperature range of 723-1073 K. IR and Raman spectroscopy, AES, XPS, ellipsometry, XRD using the synchrotron radiation, SEM, HREM, SAED, AFM, measurements of hardness by nanoindenter and spectrophotometry measurements were applied to study their physicochemical properties. The SiCxN y films exhibit high optical transmittance in the spectra range of 1200-2200 nm. Microhardness of these films increases from 18 to 28 GPa, while Young's modulus changes from 135.5 to 185.5 GPa with Si-C bonds content.

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M3 - Paper

AN - SCOPUS:31744446925

SP - 1074

EP - 1081

Y2 - 5 September 2005 through 9 September 2005

ER -

Nanocrystalline films of silicon carbonitride: Chemical composition and bonding and functional properties

Abstract

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