Abstract
Nanofabrication on Si oxide with a low-energy electron-beam-stimulated reaction has been demonstrated using scanning tunneling microscopy (STM) and the mechanism of the low-energy electron-induced etching is investigated further. Direct fabrication of a thin Ag film with this low-energy e-beam/STM method was also tested, which shows an additional capability of the nanofabrication technique. Nanometer-scale patterning of rings on a thin Si-oxide layer using this method shows that further progress nanolithography can be expected with the fabricated Si oxide as a mask.
Original language | English |
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Pages (from-to) | 1621-1623 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 74 |
Issue number | 11 |
DOIs | |
Publication status | Published - 1999 |