Nanoprocessing and nanofabrication of a structured polymer film by the focused-ion-beam technique

Ken Ichi Niihara; Takeshi Kaneko; Toshiaki Suzuki; Yasuhiko Sato; Hideo Nishioka; Yukihiro Nishikawa; Toshio Nishi; Hiroshi Jinnai

doi:10.1021/ma048380m

Nanoprocessing and nanofabrication of a structured polymer film by the focused-ion-beam technique

Ken Ichi Niihara, Takeshi Kaneko, Toshiaki Suzuki, Yasuhiko Sato, Hideo Nishioka, Yukihiro Nishikawa, Toshio Nishi, Hiroshi Jinnai

Research output: Contribution to journal › Article › peer-review

36 Citations (Scopus)

Abstract

The focused-ion-beam (FIB) technique, a powerful tool for semiconductor-related processing, was used for the nanoprocessing and nanofabrication of a structured polymer film. The milling of poly(styrene-block-isoprene) (SI) copolymer ultrathin film, leaving the PVF substrate untouched, by choosing the milling depth was discussed. The SI diblock copolymer, a purely polymeric specimen without any kind of support such as Si substrate, was easily milled, at the cryotemperature. A FIB microscope was used for imaging and milling the block copolymer film. The channel made by the FIB milling had walls with G-type nanopatterns.

Original language	English
Pages (from-to)	3048-3050
Number of pages	3
Journal	Macromolecules
Volume	38
Issue number	8
DOIs	https://doi.org/10.1021/ma048380m
Publication status	Published - 2005 Apr 19
Externally published	Yes

ASJC Scopus subject areas

Organic Chemistry
Polymers and Plastics
Inorganic Chemistry
Materials Chemistry

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10.1021/ma048380m

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abstract = "The focused-ion-beam (FIB) technique, a powerful tool for semiconductor-related processing, was used for the nanoprocessing and nanofabrication of a structured polymer film. The milling of poly(styrene-block-isoprene) (SI) copolymer ultrathin film, leaving the PVF substrate untouched, by choosing the milling depth was discussed. The SI diblock copolymer, a purely polymeric specimen without any kind of support such as Si substrate, was easily milled, at the cryotemperature. A FIB microscope was used for imaging and milling the block copolymer film. The channel made by the FIB milling had walls with G-type nanopatterns.",

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T1 - Nanoprocessing and nanofabrication of a structured polymer film by the focused-ion-beam technique

AU - Niihara, Ken Ichi

AU - Kaneko, Takeshi

AU - Suzuki, Toshiaki

AU - Sato, Yasuhiko

AU - Nishioka, Hideo

AU - Nishikawa, Yukihiro

AU - Nishi, Toshio

AU - Jinnai, Hiroshi

PY - 2005/4/19

Y1 - 2005/4/19

N2 - The focused-ion-beam (FIB) technique, a powerful tool for semiconductor-related processing, was used for the nanoprocessing and nanofabrication of a structured polymer film. The milling of poly(styrene-block-isoprene) (SI) copolymer ultrathin film, leaving the PVF substrate untouched, by choosing the milling depth was discussed. The SI diblock copolymer, a purely polymeric specimen without any kind of support such as Si substrate, was easily milled, at the cryotemperature. A FIB microscope was used for imaging and milling the block copolymer film. The channel made by the FIB milling had walls with G-type nanopatterns.

AB - The focused-ion-beam (FIB) technique, a powerful tool for semiconductor-related processing, was used for the nanoprocessing and nanofabrication of a structured polymer film. The milling of poly(styrene-block-isoprene) (SI) copolymer ultrathin film, leaving the PVF substrate untouched, by choosing the milling depth was discussed. The SI diblock copolymer, a purely polymeric specimen without any kind of support such as Si substrate, was easily milled, at the cryotemperature. A FIB microscope was used for imaging and milling the block copolymer film. The channel made by the FIB milling had walls with G-type nanopatterns.

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Nanoprocessing and nanofabrication of a structured polymer film by the focused-ion-beam technique

Abstract

ASJC Scopus subject areas

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