Nanoscale liquid phase epitaxy between Si and Au nanoparticles

Yutaka Wakayama, Haruko Fujinuma, Shun Ichiro Tanaka

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


A self-assembly technique was used for fabrication of a Si/metal interface in nanometer scale. Fine particles of gold of nanometer-order diameter were generated by a gas-phase condensation method and deposited on a Si substrate. Through a heat treatment and a cooling process, a nanoscopic Si-Au composite structure was formed on the surface of the Si substrate. Then, surface diffusing Si atoms played an important role for fabrication of the Si-Au structure which were epitaxially grown projecting onto the substrate. Furthermore, the Si/Au interface was atomically flat with no mixed-layer formation, and the Au nanoparticles also had the same crystal orientation as that of the Si dots in spite of a large lattice constant mismatch between them. This structure was considered to be fabricated as a result of minimization of the total surface and interface energy of the Si/Au system.

Original languageEnglish
Pages (from-to)1492-1496
Number of pages5
JournalJournal of Materials Research
Issue number6
Publication statusPublished - 1998 Jun
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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