Near-field engineering for boosting the photoelectrochemical activity to a modal strong coupling structure

Yanfeng Cao, Xu Shi, Tomoya Oshikiri, Shuai Zu, Yuji Sunaba, Keiji Sasaki, Hiroaki Misawa

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

Near-field engineering is considered a significant strategy in constructing plasmonic nanostructures for efficient plasmonic chemistry. We demonstrate interfacial near-field engineering on a Au-NP/TiO2/Au-film (ATA) photoanode to improve the water oxidation efficiency. To tailor the near-field distribution, postdeposited Au on an ATA electrode (Au@ATA) is implemented using a facile constant potential electrolysis technique. As a result, the average photocurrent conversion efficiency of Au@ATA is approximately 1.3-fold higher than that of ATA.

Original languageEnglish
Pages (from-to)524-527
Number of pages4
JournalChemical Communications
Volume57
Issue number4
DOIs
Publication statusPublished - 2021 Jan 14

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