Near-infrared reflection from periodically aluminium-doped zinc oxide thin films

Yoshiki Okuhara; Takeharu Kato; Hideaki Matsubara; Norifumi Isu; Masasuke Takata

doi:10.1016/j.tsf.2010.11.007

Near-infrared reflection from periodically aluminium-doped zinc oxide thin films

Yoshiki Okuhara, Takeharu Kato, Hideaki Matsubara, Norifumi Isu, Masasuke Takata

ENV - Environmental Studies for Advanced Society

Research output: Contribution to journal › Article › peer-review

46 Citations (Scopus)

Abstract

Multilayers of aluminium-doped zinc oxide (Al:ZnO) as a heat-reflection material were prepared by a reactive sputtering method with intermittent Al doping or Al content modulation. A drop in the refractive indices n around the plasma wavelength λ_p of 1456 nm for the optimally-doped Al:ZnO layers formed the periodic distribution of n in the multilayers. The periodic n provided selective reflection of approximately 60% under λ_p and shielded near-infrared solar radiation containing high energy, which was impossible to be reflected from the Al:ZnO monolayer. The selective reflection was accompanied by infrared reflection above λ_p, low emissivity and no subsequent visible reflection, which allowed the multilayers to achieve compatibility between the solar heat gain coefficient of 0.6 and the visible transmittance of nearly 80%.

Original language	English
Pages (from-to)	2280-2286
Number of pages	7
Journal	Thin Solid Films
Volume	519
Issue number	7
DOIs	https://doi.org/10.1016/j.tsf.2010.11.007
Publication status	Published - 2011 Jan 31

Keywords

Al-doped ZnO
Heat shielding
Multilayer
Reactive magnetron sputtering
Transparent conductive oxides

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10.1016/j.tsf.2010.11.007

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title = "Near-infrared reflection from periodically aluminium-doped zinc oxide thin films",

abstract = "Multilayers of aluminium-doped zinc oxide (Al:ZnO) as a heat-reflection material were prepared by a reactive sputtering method with intermittent Al doping or Al content modulation. A drop in the refractive indices n around the plasma wavelength λp of 1456 nm for the optimally-doped Al:ZnO layers formed the periodic distribution of n in the multilayers. The periodic n provided selective reflection of approximately 60% under λp and shielded near-infrared solar radiation containing high energy, which was impossible to be reflected from the Al:ZnO monolayer. The selective reflection was accompanied by infrared reflection above λp, low emissivity and no subsequent visible reflection, which allowed the multilayers to achieve compatibility between the solar heat gain coefficient of 0.6 and the visible transmittance of nearly 80%.",

keywords = "Al-doped ZnO, Heat shielding, Multilayer, Reactive magnetron sputtering, Transparent conductive oxides",

author = "Yoshiki Okuhara and Takeharu Kato and Hideaki Matsubara and Norifumi Isu and Masasuke Takata",

note = "Funding Information: This work was supported by the New Energy and Industrial Technology Development Organization (NEDO) as “The Project of Development of Multi-ceramic Films for New Thermal Insulators”.",

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doi = "10.1016/j.tsf.2010.11.007",

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T1 - Near-infrared reflection from periodically aluminium-doped zinc oxide thin films

AU - Okuhara, Yoshiki

AU - Kato, Takeharu

AU - Matsubara, Hideaki

AU - Isu, Norifumi

AU - Takata, Masasuke

N1 - Funding Information: This work was supported by the New Energy and Industrial Technology Development Organization (NEDO) as “The Project of Development of Multi-ceramic Films for New Thermal Insulators”.

PY - 2011/1/31

Y1 - 2011/1/31

N2 - Multilayers of aluminium-doped zinc oxide (Al:ZnO) as a heat-reflection material were prepared by a reactive sputtering method with intermittent Al doping or Al content modulation. A drop in the refractive indices n around the plasma wavelength λp of 1456 nm for the optimally-doped Al:ZnO layers formed the periodic distribution of n in the multilayers. The periodic n provided selective reflection of approximately 60% under λp and shielded near-infrared solar radiation containing high energy, which was impossible to be reflected from the Al:ZnO monolayer. The selective reflection was accompanied by infrared reflection above λp, low emissivity and no subsequent visible reflection, which allowed the multilayers to achieve compatibility between the solar heat gain coefficient of 0.6 and the visible transmittance of nearly 80%.

AB - Multilayers of aluminium-doped zinc oxide (Al:ZnO) as a heat-reflection material were prepared by a reactive sputtering method with intermittent Al doping or Al content modulation. A drop in the refractive indices n around the plasma wavelength λp of 1456 nm for the optimally-doped Al:ZnO layers formed the periodic distribution of n in the multilayers. The periodic n provided selective reflection of approximately 60% under λp and shielded near-infrared solar radiation containing high energy, which was impossible to be reflected from the Al:ZnO monolayer. The selective reflection was accompanied by infrared reflection above λp, low emissivity and no subsequent visible reflection, which allowed the multilayers to achieve compatibility between the solar heat gain coefficient of 0.6 and the visible transmittance of nearly 80%.

KW - Al-doped ZnO

KW - Heat shielding

KW - Multilayer

KW - Reactive magnetron sputtering

KW - Transparent conductive oxides

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ER -

Near-infrared reflection from periodically aluminium-doped zinc oxide thin films

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Keywords

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