New fast atom beam processing with separated masks for fabricating multiple microstructures

K. Ichiki, M. Hatakeyama, S. Tanaka, M. Nakao, Y. Hatamura

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


We present a new fast atom beam (FAB) processing method called the moving mask FAB (MM-FAB) processing method that uses relative motion between a patterned separated mask and a workpiece to fabricate multiple microstructures. To evaluate the performance of this method, we developed a micro-positioner to control the relative motion between the patterned separated mask and the workpiece and applied the micro-positioner to fabricate micro-optics arrays, which are multiple microstructures. The separated mask was a 10 μm thick nickel film with micrometer-sized multiple patterned holes. This mask had been made by electroforming. The workpiece was either glass or GaAs. The FAB source had parallel-plate electrodes and used either SF6 (sulfur hexafluoride) gas (for the glass workpiece) or Cl2 (chlorine) gas (for GaAs). The mask and the workpiece were moved relative to each other by the developed micro-positioner. We demonstrated the fabrication of a micro-diffraction grating-like object whose height is 230 nm, pitch is 40 μm by GaAs, and we confirmed that the etching depth is in proportion to the FAB exposure time. Our success in fabricating the micro-optics arrays demonstrated that the combination of FAB processing and relative motion between a mask and a workpiece is effective for producing multiple microstructures that have sloped or curved surfaces.

Original languageEnglish
Pages (from-to)630-633
Number of pages4
JournalThin Solid Films
Issue number1-2
Publication statusPublished - 1996 Aug 1


  • Atomic and molecular beam studies
  • Etching
  • Silicon oxide
  • Surface morphology


Dive into the research topics of 'New fast atom beam processing with separated masks for fabricating multiple microstructures'. Together they form a unique fingerprint.

Cite this