New metalorganic chemical vapor deposition process in a high magnetic field for YBa2Cu3O7

Yanwei Ma; Kazuo Watanabe; Satoshi Awaji; Mitsuhiro Motokawa

doi:10.1143/jjap.39.l726

New metalorganic chemical vapor deposition process in a high magnetic field for YBa₂Cu₃O₇

Yanwei Ma, Kazuo Watanabe, Satoshi Awaji, Mitsuhiro Motokawa

IMR - High Field Laboratory for Superconducting Materials

Tohoku University

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

A hot-wall-type metalorganic chemical vapor deposition (MOCVD) apparatus combined with a cryocooled superconducting magnet was recently developed. This system allows the application of magnetic fields up to 11 T for the MOCVD process. After making various improvements, we succeeded in fabricating YBa₂Cu₃O₇ (YBCO) films under optimal deposition conditions. It is found that the crystallinity of YBCO films produced on polycrystalline silver substrates by the magnetic-field-assisted CVD process is improved as compared with those without the magnetic field.

Original language	English
Pages (from-to)	L726-L729
Journal	Japanese Journal of Applied Physics
Volume	39
Issue number	7
DOIs	https://doi.org/10.1143/jjap.39.l726
Publication status	Published - 2000

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10.1143/jjap.39.l726

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New metalorganic chemical vapor deposition process in a high magnetic field for YBa₂Cu₃O₇

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