New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions

Kazuhiro Nishikawa; Masakiyo Tsunoda; Satoshi Ogata; Migaku Takahashi

doi:10.1109/INTMAG.2002.1001032

New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions

Kazuhiro Nishikawa, Masakiyo Tsunoda, Satoshi Ogata, Migaku Takahashi

ENG - Electronic Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The quality of the tunneling barrier is the most important factor for magnetic tunnel junctions (MTJs). Plasma oxidization of metallic Al layer is a promising method to obtain a tunneling barrier, however, high-energy ions irradiated from the plasma discharging space are liable to damage the structure of the ultra-thin oxide layers. In the present study, we introduced a new plasma source for oxidization processes of ultra-thin Al layers, which reduces the electron temperature, leading to a low space potential; i.e. low accelerating energy of ions in the plasma.

Original language	English
Title of host publication	INTERMAG Europe 2002 - IEEE International Magnetics Conference
Editors	J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	0780373650, 9780780373655
DOIs	https://doi.org/10.1109/INTMAG.2002.1001032
Publication status	Published - 2002 Jan 1
Event	2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands Duration: 2002 Apr 28 → 2002 May 2

Publication series

Name	INTERMAG Europe 2002 - IEEE International Magnetics Conference

Other

Other	2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
Country/Territory	Netherlands
City	Amsterdam
Period	02/4/28 → 02/5/2

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering
Surfaces, Coatings and Films

Access to Document

10.1109/INTMAG.2002.1001032

Cite this

Nishikawa, K., Tsunoda, M., Ogata, S., & Takahashi, M. (2002). New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions. In J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, J. De Boeck, & R. Wood (Eds.), INTERMAG Europe 2002 - IEEE International Magnetics Conference [1001032] (INTERMAG Europe 2002 - IEEE International Magnetics Conference). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2002.1001032

New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions. / Nishikawa, Kazuhiro; Tsunoda, Masakiyo; Ogata, Satoshi et al.
INTERMAG Europe 2002 - IEEE International Magnetics Conference. ed. / J. Fidler; B. Hillebrands; C. Ross; D. Weller; L. Folks; E. Hill; M. Vazquez Villalabeitia; J. A. Bain; Jo De Boeck; R. Wood. Institute of Electrical and Electronics Engineers Inc., 2002. 1001032 (INTERMAG Europe 2002 - IEEE International Magnetics Conference).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Nishikawa, K, Tsunoda, M, Ogata, S & Takahashi, M 2002, New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions. in J Fidler, B Hillebrands, C Ross, D Weller, L Folks, E Hill, M Vazquez Villalabeitia, JA Bain, J De Boeck & R Wood (eds), INTERMAG Europe 2002 - IEEE International Magnetics Conference., 1001032, INTERMAG Europe 2002 - IEEE International Magnetics Conference, Institute of Electrical and Electronics Engineers Inc., 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002, Amsterdam, Netherlands, 02/4/28. https://doi.org/10.1109/INTMAG.2002.1001032

Nishikawa K, Tsunoda M, Ogata S, Takahashi M. New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions. In Fidler J, Hillebrands B, Ross C, Weller D, Folks L, Hill E, Vazquez Villalabeitia M, Bain JA, De Boeck J, Wood R, editors, INTERMAG Europe 2002 - IEEE International Magnetics Conference. Institute of Electrical and Electronics Engineers Inc. 2002. 1001032. (INTERMAG Europe 2002 - IEEE International Magnetics Conference). doi: 10.1109/INTMAG.2002.1001032

Nishikawa, Kazuhiro ; Tsunoda, Masakiyo ; Ogata, Satoshi et al. / New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions. INTERMAG Europe 2002 - IEEE International Magnetics Conference. editor / J. Fidler ; B. Hillebrands ; C. Ross ; D. Weller ; L. Folks ; E. Hill ; M. Vazquez Villalabeitia ; J. A. Bain ; Jo De Boeck ; R. Wood. Institute of Electrical and Electronics Engineers Inc., 2002. (INTERMAG Europe 2002 - IEEE International Magnetics Conference).

@inproceedings{7fef8a147ed640f29709e480a8ac23e1,

title = "New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions",

abstract = "The quality of the tunneling barrier is the most important factor for magnetic tunnel junctions (MTJs). Plasma oxidization of metallic Al layer is a promising method to obtain a tunneling barrier, however, high-energy ions irradiated from the plasma discharging space are liable to damage the structure of the ultra-thin oxide layers. In the present study, we introduced a new plasma source for oxidization processes of ultra-thin Al layers, which reduces the electron temperature, leading to a low space potential; i.e. low accelerating energy of ions in the plasma.",

author = "Kazuhiro Nishikawa and Masakiyo Tsunoda and Satoshi Ogata and Migaku Takahashi",

year = "2002",

month = jan,

day = "1",

doi = "10.1109/INTMAG.2002.1001032",

language = "English",

series = "INTERMAG Europe 2002 - IEEE International Magnetics Conference",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

editor = "J. Fidler and B. Hillebrands and C. Ross and D. Weller and L. Folks and E. Hill and {Vazquez Villalabeitia}, M. and Bain, {J. A.} and {De Boeck}, Jo and R. Wood",

booktitle = "INTERMAG Europe 2002 - IEEE International Magnetics Conference",

note = "2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 ; Conference date: 28-04-2002 Through 02-05-2002",

}

TY - GEN

T1 - New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions

AU - Nishikawa, Kazuhiro

AU - Tsunoda, Masakiyo

AU - Ogata, Satoshi

AU - Takahashi, Migaku

PY - 2002/1/1

Y1 - 2002/1/1

N2 - The quality of the tunneling barrier is the most important factor for magnetic tunnel junctions (MTJs). Plasma oxidization of metallic Al layer is a promising method to obtain a tunneling barrier, however, high-energy ions irradiated from the plasma discharging space are liable to damage the structure of the ultra-thin oxide layers. In the present study, we introduced a new plasma source for oxidization processes of ultra-thin Al layers, which reduces the electron temperature, leading to a low space potential; i.e. low accelerating energy of ions in the plasma.

AB - The quality of the tunneling barrier is the most important factor for magnetic tunnel junctions (MTJs). Plasma oxidization of metallic Al layer is a promising method to obtain a tunneling barrier, however, high-energy ions irradiated from the plasma discharging space are liable to damage the structure of the ultra-thin oxide layers. In the present study, we introduced a new plasma source for oxidization processes of ultra-thin Al layers, which reduces the electron temperature, leading to a low space potential; i.e. low accelerating energy of ions in the plasma.

UR - http://www.scopus.com/inward/record.url?scp=85017283634&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85017283634&partnerID=8YFLogxK

U2 - 10.1109/INTMAG.2002.1001032

DO - 10.1109/INTMAG.2002.1001032

M3 - Conference contribution

AN - SCOPUS:85017283634

T3 - INTERMAG Europe 2002 - IEEE International Magnetics Conference

BT - INTERMAG Europe 2002 - IEEE International Magnetics Conference

A2 - Fidler, J.

A2 - Hillebrands, B.

A2 - Ross, C.

A2 - Weller, D.

A2 - Folks, L.

A2 - Hill, E.

A2 - Vazquez Villalabeitia, M.

A2 - Bain, J. A.

A2 - De Boeck, Jo

A2 - Wood, R.

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002

Y2 - 28 April 2002 through 2 May 2002

ER -

New plasma source with low electron temperature for fabrication of insulating barrier in ferromagnetic tunnel junctions

Abstract

Publication series

Other

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this