TY - JOUR
T1 - New three-dimensional integration technology using chip-to-wafer bonding to achieve ultimate super-chip integration
AU - Fukushima, Takafumi
AU - Yamada, Yusuke
AU - Kikuchi, Hirokazu
AU - Koyanagi, Mitsumasa
PY - 2006/4/25
Y1 - 2006/4/25
N2 - A new three-dimensional (3D) integration technology using the chip-to-wafer bonding technique provides the ultimate super-chip integration in which various kinds of chip of different sizes can be vertically stacked and electrically connected through a number of vertical interconnections. We have investigated several key technologies of vertical interconnection formation, chip alignment, chip-to-wafer bonding, adhesive injection, and chip thinning to vertically stack known good dies (KGDs) into 3D LSI chips. By using these key technologies, successful fabrication of 3D LSI test chips with vertical interconnections consisting of In-Au microbumps and buried interconnections filled with polycrystalline silicon (poly-Si) was demonstrated. The test chips was composed of three kinds of very thin chip of 5, 6, and 7mm2 and ranging in thickness from 30 to 90 μm. Each chip is tightly bonded using a low-viscosity epoxy adhesive as a dielectric material.
AB - A new three-dimensional (3D) integration technology using the chip-to-wafer bonding technique provides the ultimate super-chip integration in which various kinds of chip of different sizes can be vertically stacked and electrically connected through a number of vertical interconnections. We have investigated several key technologies of vertical interconnection formation, chip alignment, chip-to-wafer bonding, adhesive injection, and chip thinning to vertically stack known good dies (KGDs) into 3D LSI chips. By using these key technologies, successful fabrication of 3D LSI test chips with vertical interconnections consisting of In-Au microbumps and buried interconnections filled with polycrystalline silicon (poly-Si) was demonstrated. The test chips was composed of three kinds of very thin chip of 5, 6, and 7mm2 and ranging in thickness from 30 to 90 μm. Each chip is tightly bonded using a low-viscosity epoxy adhesive as a dielectric material.
KW - Adhesive injection
KW - Chemical mechanical polishing
KW - Chip alignment
KW - Chip-to-wafer bonding
KW - Deep Si etching
KW - Known good dies
KW - Super-chip integration
KW - Three-dimensional integration technology
UR - http://www.scopus.com/inward/record.url?scp=33646934683&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33646934683&partnerID=8YFLogxK
U2 - 10.1143/JJAP.45.3030
DO - 10.1143/JJAP.45.3030
M3 - Article
AN - SCOPUS:33646934683
SN - 0021-4922
VL - 45
SP - 3030
EP - 3035
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 4 B
ER -