TY - JOUR
T1 - NiMnGa nanostructures produced by electron beam lithography and Ar-ion etching
AU - Auernhammer, D.
AU - Schmitt, M.
AU - Ohtsuka, M.
AU - Kohl, M.
N1 - Funding Information:
The presented work receives funding from the Deutsche Forschungsgemeinschaft (DFG).
PY - 2008/5
Y1 - 2008/5
N2 - The technologies of electron beam lithography, dry etching and systems integration are investigated to fabricate a series of Ni-Mn-Ga double-beam structures designed with decreasing critical dimensions of 10μm, 1 μm and 400 nm. Ni-Mn-Ga thin films of 1 μm thickness are deposited by magnetron sputtering and heat-treated in free-standing condition after selective removal of the substrate. Differential scanning calorimetry and electrical resistance measurements on the films show the characteristic features of martensitic transformation above room temperature. First optical beam deflection experiments demonstrate the magnetic and thermal actuation performance of the double-beam structures.
AB - The technologies of electron beam lithography, dry etching and systems integration are investigated to fabricate a series of Ni-Mn-Ga double-beam structures designed with decreasing critical dimensions of 10μm, 1 μm and 400 nm. Ni-Mn-Ga thin films of 1 μm thickness are deposited by magnetron sputtering and heat-treated in free-standing condition after selective removal of the substrate. Differential scanning calorimetry and electrical resistance measurements on the films show the characteristic features of martensitic transformation above room temperature. First optical beam deflection experiments demonstrate the magnetic and thermal actuation performance of the double-beam structures.
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U2 - 10.1140/epjst/e2008-00683-1
DO - 10.1140/epjst/e2008-00683-1
M3 - Article
AN - SCOPUS:43049113202
SN - 1951-6355
VL - 158
SP - 249
EP - 254
JO - European Physical Journal: Special Topics
JF - European Physical Journal: Special Topics
IS - 1
ER -