Nitriding of evaporated-ti thin films by ion implantation

Yoshitaka Kasukabe, Junichi Ootubo, Shinji Nagata, Mokuyoshi Kishimoto, Yutaka Fujino, Adae Yamaguchi, Yukio Yamada

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)


Nitrogen ions (N2+) with 62 keV have been implanted into 100-nm-thick Ti films evaporated on thermally cleaned NaCl substrates. Unimplanted and N-implanted Ti films have been examined by transmission electron microscopy, Rutherford backscattering spectrometry and elastic recoil detection analysis. The analysis has provided evidence that N-implantation results in the epitaxial formation of NaCl-type TiNy and simultaneously induces the release of H from evaporated-Ti films containing TiHx. The nitriding of evaporated-Ti films is mainly divided into two elemental processes. One is accompanied by the hcp-fcc transformation and the other is not. The formation mechanism for TiNy is discussed.

Original languageEnglish
Pages (from-to)3234-3239
Number of pages6
JournalJapanese Journal of Applied Physics
Issue number6R
Publication statusPublished - 1995 Jun


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