Novel denture-cleaning system based on hydroxyl radical disinfection

Taro Kanno; Keisuke Nakamura; Hiroyo Ikai; Eisei Hayashi; Midori Shirato; Takayuki Mokudai; Atsuo Iwasawa; Yoshimi Niwano; Masahiro Kohno; Keiichi Sasaki

Novel denture-cleaning system based on hydroxyl radical disinfection

Taro Kanno, Keisuke Nakamura, Hiroyo Ikai, Eisei Hayashi, Midori Shirato, Takayuki Mokudai, Atsuo Iwasawa, Yoshimi Niwano, Masahiro Kohno, Keiichi Sasaki

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

The purpose of this study was to evaluate a new denture-cleaning device using hydroxyl radicals generated from photolysis of hydrogen peroxide (H₂O₂). Electron spin resonance analysis demonstrated that the yield of hydroxyl radicals increased with the concentration of H₂O₂ and light irradiation time. Staphylococcus aureus, Pseudomonas aeruginosa, and methicillin-resistant S aureus were killed within 10 minutes with a > 5-log reduction when treated with photolysis of 500 mM H₂O₂; Candida albicans was killed within 30 minutes with a > 4-log reduction with photolysis of 1,000 mM H₂O₂. The clinical test demonstrated that the device could effectively reduce microorganisms in denture plaque by approximately 7-log order within 20 minutes.

Original language	English
Pages (from-to)	376-380
Number of pages	5
Journal	International Journal of Prosthodontics
Volume	25
Issue number	4
Publication status	Published - 2012 Jan 1

ASJC Scopus subject areas

Oral Surgery

Cite this

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abstract = "The purpose of this study was to evaluate a new denture-cleaning device using hydroxyl radicals generated from photolysis of hydrogen peroxide (H2O2). Electron spin resonance analysis demonstrated that the yield of hydroxyl radicals increased with the concentration of H2O2 and light irradiation time. Staphylococcus aureus, Pseudomonas aeruginosa, and methicillin-resistant S aureus were killed within 10 minutes with a > 5-log reduction when treated with photolysis of 500 mM H2O2; Candida albicans was killed within 30 minutes with a > 4-log reduction with photolysis of 1,000 mM H2O2. The clinical test demonstrated that the device could effectively reduce microorganisms in denture plaque by approximately 7-log order within 20 minutes.",

author = "Taro Kanno and Keisuke Nakamura and Hiroyo Ikai and Eisei Hayashi and Midori Shirato and Takayuki Mokudai and Atsuo Iwasawa and Yoshimi Niwano and Masahiro Kohno and Keiichi Sasaki",

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AU - Kanno, Taro

AU - Nakamura, Keisuke

AU - Ikai, Hiroyo

AU - Hayashi, Eisei

AU - Shirato, Midori

AU - Mokudai, Takayuki

AU - Iwasawa, Atsuo

AU - Niwano, Yoshimi

AU - Kohno, Masahiro

AU - Sasaki, Keiichi

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AB - The purpose of this study was to evaluate a new denture-cleaning device using hydroxyl radicals generated from photolysis of hydrogen peroxide (H2O2). Electron spin resonance analysis demonstrated that the yield of hydroxyl radicals increased with the concentration of H2O2 and light irradiation time. Staphylococcus aureus, Pseudomonas aeruginosa, and methicillin-resistant S aureus were killed within 10 minutes with a > 5-log reduction when treated with photolysis of 500 mM H2O2; Candida albicans was killed within 30 minutes with a > 4-log reduction with photolysis of 1,000 mM H2O2. The clinical test demonstrated that the device could effectively reduce microorganisms in denture plaque by approximately 7-log order within 20 minutes.

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Novel denture-cleaning system based on hydroxyl radical disinfection

Abstract

ASJC Scopus subject areas

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