TY - JOUR
T1 - N+-GaAs back-gated double-quantum-well structures with full density control
AU - Muraki, Koji
AU - Kumada, Norio
AU - Saku, Tadashi
AU - Hirayama, Yoshiro
PY - 2000
Y1 - 2000
N2 - We present the fabrication of a novel double-quantum-well (DQW) structure, in which the upper electron layer is supplied via modulation doping while the lower one is fully induced through the field effect from an n+-GaAs back gate. Low-temperature transport measurements demonstrate that two-dimensional electron gases with equally high mobilities are successfully formed in the lower as well as in the upper QWs. By this approach, the electron density in the lower layer can be controlled over a wide range with a small back-gate bias, and hence the electron-density distribution in the DQW can be tuned arbitrarily by using a front gate in conjunction with the back gate.
AB - We present the fabrication of a novel double-quantum-well (DQW) structure, in which the upper electron layer is supplied via modulation doping while the lower one is fully induced through the field effect from an n+-GaAs back gate. Low-temperature transport measurements demonstrate that two-dimensional electron gases with equally high mobilities are successfully formed in the lower as well as in the upper QWs. By this approach, the electron density in the lower layer can be controlled over a wide range with a small back-gate bias, and hence the electron-density distribution in the DQW can be tuned arbitrarily by using a front gate in conjunction with the back gate.
KW - Double quantum well
KW - Modulation doping
KW - Molecular-beam epitaxy
KW - Two-dimensional electron gas
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U2 - 10.1143/jjap.39.2444
DO - 10.1143/jjap.39.2444
M3 - Article
AN - SCOPUS:0033707475
SN - 0021-4922
VL - 39
SP - 2444
EP - 2447
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 4 B
ER -