Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

Hiroyuki Hara; Goki Arai; Thanh Hung Dinh; Weihua Jiang; Taisuke Miura; Akira Endo; Takeo Ejima; Bowen Li; Padraig Dunne; Gerry O'Sullivan; Atsushi Sunahara; Takeshi Higashiguchi

doi:10.1063/1.4935817

Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

Hiroyuki Hara, Goki Arai, Thanh Hung Dinh, Weihua Jiang, Taisuke Miura, Akira Endo, Takeo Ejima, Bowen Li, Padraig Dunne, Gerry O'Sullivan, Atsushi Sunahara, Takeshi Higashiguchi

SRIS - SR Core Research Division

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18-20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.

Original language	English
Article number	193301
Journal	Journal of Applied Physics
Volume	118
Issue number	19
DOIs	https://doi.org/10.1063/1.4935817
Publication status	Published - 2015 Nov 21

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abstract = "The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18-20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.",

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T1 - Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

AU - Hara, Hiroyuki

AU - Arai, Goki

AU - Dinh, Thanh Hung

AU - Jiang, Weihua

AU - Miura, Taisuke

AU - Endo, Akira

AU - Ejima, Takeo

AU - Li, Bowen

AU - Dunne, Padraig

AU - O'Sullivan, Gerry

AU - Sunahara, Atsushi

AU - Higashiguchi, Takeshi

PY - 2015/11/21

Y1 - 2015/11/21

N2 - The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18-20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.

AB - The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18-20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.

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Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

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