Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

Hiroyuki Hara, Goki Arai, Thanh Hung Dinh, Weihua Jiang, Taisuke Miura, Akira Endo, Takeo Ejima, Bowen Li, Padraig Dunne, Gerry O'Sullivan, Atsushi Sunahara, Takeshi Higashiguchi

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)


The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18-20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.

Original languageEnglish
Article number193301
JournalJournal of Applied Physics
Issue number19
Publication statusPublished - 2015 Nov 21


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