TY - JOUR
T1 - Observation of biexciton-resonant hyper-parametric scattering in SiO 2/CUCl layered structures
AU - Nakayama, Masaaki
AU - Nishioka, Takashi
AU - Wakaiki, Shuji
AU - Oohata, Goro
AU - Mizoguchi, Kohji
AU - Kim, Dae Gwi
AU - Edamatsu, Keiichi
PY - 2007/3/9
Y1 - 2007/3/9
N2 - We have prepared SiO2/CuCl layered structures and investigated the structural and optical properties, focusing on the observation of biexciton-resonant hyper-parametric scattering that is a promising process to generate entangled photons. A crystalline CuCl film, which is the active layer, was grown on an Al2O3 substrate by a vacuum deposition method, and then an amorphous SiO2 film as the passivation layer for hygroscopic CuCl was prepared by an rf-magnetron sputtering method. X-ray diffraction patterns and optical spectra of excitons indicate that the growth of the SiO2-passivation layer does not degrade the crystallinity of the underlying CuCl thin film. It has been demonstrated that the biexciton-resonant hyper-parametric scattering is clearly observable in the SiO2/CuCl layered structure.
AB - We have prepared SiO2/CuCl layered structures and investigated the structural and optical properties, focusing on the observation of biexciton-resonant hyper-parametric scattering that is a promising process to generate entangled photons. A crystalline CuCl film, which is the active layer, was grown on an Al2O3 substrate by a vacuum deposition method, and then an amorphous SiO2 film as the passivation layer for hygroscopic CuCl was prepared by an rf-magnetron sputtering method. X-ray diffraction patterns and optical spectra of excitons indicate that the growth of the SiO2-passivation layer does not degrade the crystallinity of the underlying CuCl thin film. It has been demonstrated that the biexciton-resonant hyper-parametric scattering is clearly observable in the SiO2/CuCl layered structure.
KW - Biexciton
KW - Exciton polariton
KW - Hyper-parametric scattering
KW - SiO /CuCl layered structure
KW - Vacuum deposition
KW - rf-magnetron sputtering
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U2 - 10.1143/JJAP.46.L234
DO - 10.1143/JJAP.46.L234
M3 - Article
AN - SCOPUS:34547891514
SN - 0021-4922
VL - 46
SP - L234-L236
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 8-11
ER -