TY - JOUR
T1 - Observation of gate-controlled superconducting proximity effect in microfabricated thin graphite films
AU - Sato, T.
AU - Kanda, A.
AU - Tanaka, S.
AU - Goto, H.
AU - Ootuka, Y.
AU - Miyazaki, H.
AU - Odaka, S.
AU - Tsukagoshi, K.
AU - Aoyagi, Y.
PY - 2008/3/1
Y1 - 2008/3/1
N2 - We investigated the influence of the oxygen plasma etching on the electron transport in thin graphite films. The semimetallic temperature dependence of zero-bias resistance was observed for samples microfabricated with both Al mask and resist mask, but the possible damage by e-beam irradiation was observed in films with Al mask. In thin graphite films microfabricated by O2 plasma with resist mask, the proximity-induced superconductivity was observed and the critical supercurrent and temperature strongly depend on the gate voltage.
AB - We investigated the influence of the oxygen plasma etching on the electron transport in thin graphite films. The semimetallic temperature dependence of zero-bias resistance was observed for samples microfabricated with both Al mask and resist mask, but the possible damage by e-beam irradiation was observed in films with Al mask. In thin graphite films microfabricated by O2 plasma with resist mask, the proximity-induced superconductivity was observed and the critical supercurrent and temperature strongly depend on the gate voltage.
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U2 - 10.1088/1742-6596/109/1/012031
DO - 10.1088/1742-6596/109/1/012031
M3 - Article
AN - SCOPUS:44649108306
SN - 1742-6588
VL - 109
JO - Journal of Physics: Conference Series
JF - Journal of Physics: Conference Series
IS - 1
M1 - 012031
ER -