TY - JOUR
T1 - Observation of sputtering of yttrium from Y2O3 ceramics by low-energy Ar, Kr, and Xe ion bombardment in microwave-excited plasma
AU - Goto, Tetsuya
AU - Sugawa, Shigetoshi
N1 - Publisher Copyright:
© 2015 The Japan Society of Applied Physics.
PY - 2015/12
Y1 - 2015/12
N2 - Y2O3 ceramics were immersed in microwave-excited Ar, Kr, and Xe plasmas, and the sputtering of yttrium atoms from Y2O3 ceramics as a result of low-energy (range of approximately 10 eV) Ar, Kr, and Xe ion bombardment was observed. The amount of sputtered yttrium atoms well correlated with the ion bombardment energy estimated by Langmuir probe measurement. The estimated sputtering yield was 10-5 or less for such a low ion bombardment condition.
AB - Y2O3 ceramics were immersed in microwave-excited Ar, Kr, and Xe plasmas, and the sputtering of yttrium atoms from Y2O3 ceramics as a result of low-energy (range of approximately 10 eV) Ar, Kr, and Xe ion bombardment was observed. The amount of sputtered yttrium atoms well correlated with the ion bombardment energy estimated by Langmuir probe measurement. The estimated sputtering yield was 10-5 or less for such a low ion bombardment condition.
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U2 - 10.7567/JJAP.54.128003
DO - 10.7567/JJAP.54.128003
M3 - Article
AN - SCOPUS:84948665225
SN - 0021-4922
VL - 54
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 12
M1 - 128003
ER -