One-step production of anisotropically etched graphene using supercritical water

Takaaki Tomai; Naoki Tamura; Itaru Honma

doi:10.1021/mz400186t

One-step production of anisotropically etched graphene using supercritical water

Takaaki Tomai, Naoki Tamura, Itaru Honma

Tohoku University

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

We developed a one-step method for production of anisotropically etched graphene using supercritical fluid (SCF). Anisotropic etching of a graphite substrate and dispersed graphite powder with Ag nanoparticles was conducted in supercritical water (SCW). Because of the exfoliation effect of SCF, graphene was isolated from the graphite simultaneously with the anisotropic etching. High-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy revealed the production of multilayer graphene exfoliated from the anisotropically etched graphite surface.

Original language	English
Pages (from-to)	794-798
Number of pages	5
Journal	ACS Macro Letters
Volume	2
Issue number	9
DOIs	https://doi.org/10.1021/mz400186t
Publication status	Published - 2013 Sept 17

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10.1021/mz400186t

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AB - We developed a one-step method for production of anisotropically etched graphene using supercritical fluid (SCF). Anisotropic etching of a graphite substrate and dispersed graphite powder with Ag nanoparticles was conducted in supercritical water (SCW). Because of the exfoliation effect of SCF, graphene was isolated from the graphite simultaneously with the anisotropic etching. High-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy revealed the production of multilayer graphene exfoliated from the anisotropically etched graphite surface.

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One-step production of anisotropically etched graphene using supercritical water

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