Optical scanning probe system for electromagnetic near field measurements

Masanori Takahashi; Katsumi Kawasaki; Hiroyuki Ohba; Tomokazu Ikenaga; Hiroyasu Ota; Tatsuru Orikasa; Nobuyasu Adachi; Kazushi Ishiyama; Ken Ichi Arai

doi:10.1109/ISEMC.2009.5284593

Optical scanning probe system for electromagnetic near field measurements

Masanori Takahashi, Katsumi Kawasaki, Hiroyuki Ohba, Tomokazu Ikenaga, Hiroyasu Ota, Tatsuru Orikasa, Nobuyasu Adachi, Kazushi Ishiyama, Ken Ichi Arai

RIEC - Human and Bio Information Systems Division

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

6 Citations (Scopus)

Abstract

An optical scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for high speed, low-invasive measurement of electromagnetic near field distribution. We demonstrate the measurement of electric field distributions using a LiNbO ₃ crystal substrate and the probe system. We also measure magnetic field distributions above a microstrip line in the gigahertz range using a magnetic garnet thin film. The probe system is also used for measuring electromagnetic field distributions above a commercially available IC.

Original language	English
Title of host publication	2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009
Pages	6-11
Number of pages	6
DOIs	https://doi.org/10.1109/ISEMC.2009.5284593
Publication status	Published - 2009
Event	2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009 - Austin, TX, United States Duration: 2009 Aug 17 → 2009 Aug 21

Publication series

Name	IEEE International Symposium on Electromagnetic Compatibility
ISSN (Print)	1077-4076

Conference

Conference	2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009
Country/Territory	United States
City	Austin, TX
Period	09/8/17 → 09/8/21

Keywords

Electro-optic effect
Electromagnetic field
Galvano scanner
Magneto-optic effect

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10.1109/ISEMC.2009.5284593

Cite this

Takahashi, M., Kawasaki, K., Ohba, H., Ikenaga, T., Ota, H., Orikasa, T., Adachi, N., Ishiyama, K., & Arai, K. I. (2009). Optical scanning probe system for electromagnetic near field measurements. In 2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009 (pp. 6-11). Article 5284593 (IEEE International Symposium on Electromagnetic Compatibility). https://doi.org/10.1109/ISEMC.2009.5284593

@inproceedings{d813a65d7b9f46df90fbf643595dbcbd,

title = "Optical scanning probe system for electromagnetic near field measurements",

abstract = "An optical scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for high speed, low-invasive measurement of electromagnetic near field distribution. We demonstrate the measurement of electric field distributions using a LiNbO 3 crystal substrate and the probe system. We also measure magnetic field distributions above a microstrip line in the gigahertz range using a magnetic garnet thin film. The probe system is also used for measuring electromagnetic field distributions above a commercially available IC.",

keywords = "Electro-optic effect, Electromagnetic field, Galvano scanner, Magneto-optic effect",

author = "Masanori Takahashi and Katsumi Kawasaki and Hiroyuki Ohba and Tomokazu Ikenaga and Hiroyasu Ota and Tatsuru Orikasa and Nobuyasu Adachi and Kazushi Ishiyama and Arai, {Ken Ichi}",

year = "2009",

doi = "10.1109/ISEMC.2009.5284593",

language = "English",

isbn = "9781424442676",

series = "IEEE International Symposium on Electromagnetic Compatibility",

pages = "6--11",

booktitle = "2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009",

note = "2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009 ; Conference date: 17-08-2009 Through 21-08-2009",

}

Takahashi, M, Kawasaki, K, Ohba, H, Ikenaga, T, Ota, H, Orikasa, T, Adachi, N, Ishiyama, K & Arai, KI 2009, Optical scanning probe system for electromagnetic near field measurements. in 2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009., 5284593, IEEE International Symposium on Electromagnetic Compatibility, pp. 6-11, 2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009, Austin, TX, United States, 09/8/17. https://doi.org/10.1109/ISEMC.2009.5284593

Optical scanning probe system for electromagnetic near field measurements. / Takahashi, Masanori; Kawasaki, Katsumi; Ohba, Hiroyuki et al.
2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009. 2009. p. 6-11 5284593 (IEEE International Symposium on Electromagnetic Compatibility).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Optical scanning probe system for electromagnetic near field measurements

AU - Takahashi, Masanori

AU - Kawasaki, Katsumi

AU - Ohba, Hiroyuki

AU - Ikenaga, Tomokazu

AU - Ota, Hiroyasu

AU - Orikasa, Tatsuru

AU - Adachi, Nobuyasu

AU - Ishiyama, Kazushi

AU - Arai, Ken Ichi

PY - 2009

Y1 - 2009

N2 - An optical scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for high speed, low-invasive measurement of electromagnetic near field distribution. We demonstrate the measurement of electric field distributions using a LiNbO 3 crystal substrate and the probe system. We also measure magnetic field distributions above a microstrip line in the gigahertz range using a magnetic garnet thin film. The probe system is also used for measuring electromagnetic field distributions above a commercially available IC.

AB - An optical scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for high speed, low-invasive measurement of electromagnetic near field distribution. We demonstrate the measurement of electric field distributions using a LiNbO 3 crystal substrate and the probe system. We also measure magnetic field distributions above a microstrip line in the gigahertz range using a magnetic garnet thin film. The probe system is also used for measuring electromagnetic field distributions above a commercially available IC.

KW - Electro-optic effect

KW - Electromagnetic field

KW - Galvano scanner

KW - Magneto-optic effect

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BT - 2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009

T2 - 2009 IEEE International Symposium on Electromagnetic Compatibility, EMC 2009

Y2 - 17 August 2009 through 21 August 2009

ER -

Optical scanning probe system for electromagnetic near field measurements

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