Optimal structure for high-performance and low-contact-resistance organic field-effect transistors using contact-doped coplanar and pseudo-staggered device architectures

Engineering

• Architecture 40%
• Channel Region 20%
• Charge Injection 20%
• Device Structure 20%
• Dopants 20%
• Iron 20%
• Line Method 20%
• Optimal Structure 20%
• Organic Field Effect Transistors 80%
• Performance 40%
• Transistor 40%

Physics

• Achievement 20%
• Degradation 20%
• Field Effect 20%
• Iron 20%
• Metal 20%
• Mobility 20%
• Organic Semiconductor 20%
• Performance 40%
• Ratios 20%
• Semiconductor 20%
• Transferring 20%

Material Science

• Contact Resistance 60%
• Devices 100%
• Doping (Additives) 20%
• Semiconductor Material 20%