Optimizing imprinting condition for high aspect grating of Pd-based metallic glass

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X-ray phase contrast imaging with an X-ray Talbot interferometer has attracted attention because it exhibits high sensitivity for materials consisting of light elements with weak X-ray absorption. In order to improve the sensitivity of X-ray Talbot interferometer, the development of amplitude grating (G2) with a high aspect ratio is necessary. Conventionally, such gratings are fabricated by electroplating of Au. However, this technique suffers from its high cost and is time consuming to obtain large-area uniform pattern. Recently, Yashiro et al. have developed an innovative method to fabricate high aspect ratio gratings in low cost. They applied imprinting method using viscous flow of Pd42.5Ni7.5Cu30P20 metallic glass and successfully fabricated grating G2 with aspect ratio of 2.5. Furthermore, they also demonstrated that the grating can be used for X-ray phase contrast imaging with an X-ray Talbot interferometer. In the present study, we intend to optimize the imprinting conditions of Pd-based metallic glass to achieve higher aspect ratio, and metallic glass with maximum filling depth was estimated by resistance heating.

Original languageJapanese
Pages (from-to)52-56
Number of pages5
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Issue number1
Publication statusPublished - 2018

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